References
- A. P. Ramirez, Science 35, 1377 (2007)
- Kenji Nomura, Hiromichi Ohta, Akihiro Takagi, Toshio Kamiya, Masahiro Hirano, and Hideo Hosono, Nature 432, 488 (2004) https://doi.org/10.1038/nature03090
- Satoshi Masuda, Ken Kitamura, Yoshihiro Okumura, Shigehiro Miyatake, Hitoshi Tabata, and Tomoji Kawai, J. Appl. Phys. 93, 3 (2003)
- S. J. Pearton, D. P. Norton, K. Ip, Y. W. Heo, and T. Steiner, J. Vac. Sci. Technol. B 22, 3 (2004)
- Elvira M. C. Fortunato, Pedro M. C. Barquinha, Ana C. M. B. G. Pimentel, Alexandra M. F. Gonçalves, Antonio J. S. Marques, Rodrigo F. P. Martins, and Luis M.N. Pereira, Appl. Phys. Lett. 85, 2541 (2004) https://doi.org/10.1063/1.1790587
- H. Q. Chiang, J. F. Wager, R. L. Hoffman, J. Jeong, and D. A. Keszler, Appl. Phys. Lett. 86, 013503 (2005)
- N. L. Dehuff, E. S. Kettenring, D. Hong, H. Q. Chiang, J. F. Wager, R. L. Hoffman, C.-H. Park, and D. A. Keszler, J. Appl. Phys. 97, 064505 (2005) https://doi.org/10.1063/1.1862767
- Jackson, W. B., Hoffman, R. L., Herman, G. S., Appl. Phys. Lett. 87, 193503 (2005) https://doi.org/10.1063/1.2120895
- D. K. Hwang,Ji Hoon Park,Jiyoul Lee,Jeong-M. Choi,Jae Hoon Kim,Eugene Kim,andSeongil Im, Journal of The Electrochemical Society. 153, 1 (2006)
- P. F. Carcia, R. S. McLean, and M. H. Reilly, Appl. Phys. Lett. 88, 123509 (2006)
- Il-Doo Kim, Mi-Hwa Lim, KyongTae Kang, Ho-Gi Kim, Si-Young Choi, Appl. Phys. Lett. 89, 022905 (2006) https://doi.org/10.1063/1.2220485
- Hsing-Hung Hsieh, Chung-Chih Wu, Appl. Phys. Lett. 89, 041109 (2006) https://doi.org/10.1063/1.2235895
- Hisato Yabuta, Masafumi Sano, Katsumi Abe, Toshiaki Aiba, Tohru Den, Hideya Kumomi, Kenji Nomura, Toshio Kamiya, and Hideo Hosono, Appl. Phys. Lett. 89, 112123 (2006) https://doi.org/10.1063/1.2353811
- Kimoon Lee, Jae Hoon Kim, Seongil Im, Chang Su Kim, and Hong Koo Baik, Appl. Phys. Lett. 89, 133507 (2006) https://doi.org/10.1063/1.2357559
- Minkyu Kim, Jong Han Jeong, Hun Jung Lee, Tae Kyung Ahn, Hyun Soo Shin, Jin-Seong Park, Jae Kyeong Jeong, Yeon-Gon Mo, and Hye Dong Kim, Appl. Phys. Lett. 90, 212114 (2007) https://doi.org/10.1063/1.2742790
- M.-H. Cho, Y. S. Roh, C. N. Whang, K. Jeong, H. J. Choi, S. W. Nam, D.-H. Ko, J. H. Lee, N. I. Lee, and K. Fujihara, Appl. Phys. Lett. 81, 1071 (2002) https://doi.org/10.1063/1.1499223
- H. Wong, N. Zhan, K.L. Ng, M.C. Poon, C.W. Kok, Thin Solid Films 462-463, 96-100 (2004) https://doi.org/10.1016/j.tsf.2004.05.031
- Byung Du Ahn, Hong Seong Kang, Jong Hoon Kim, Gun Hee Kim, Hyun Woo Chang, and Sang Yeol Lee, J. Appl. Phys. 100, 093701 (2006) https://doi.org/10.1063/1.2364041
- Jae Won Kim, Hong Seong Kang, Jong Hoon Kim, Sang Yeol Lee, Jung-Kun Lee, and Michael Nastasi, J. Appl. Phys.100, 033701 (2006) https://doi.org/10.1063/1.2219153
- Hong Seong Kang, Byung Du Ahn, Jong Hoon Kim, Gun Hee Kim, Sung Hoon Lim, Hyun Woo Chang, and Sang Yeol Lee, Appl. Phys Lett. 88, 202108 (2006)
- Jeong J K, Yang H W, Jeong J H, Mo Y G and Kim H D, Appl. Phys. Lett. 93 123508 (2008) https://doi.org/10.1063/1.2990657
- Wei-Tsung Chen, Shih-Yi Lo, Shih-Chin Kao, Hsiao-Wen Zan, Chuang-Chuang Tsai, Jian-Hong Lin, Chun-Hsiang Fang, and Chung-Chun Lee, IEEE ELECTRON DEVICE LETTERS, 32, 11 (2011)
- Kwang Hwan Ji, Ji-In Kim, Yeon-Gon Mo, Jong Han Jeong, Shinhyuk Yang, Chi-Sun Hwang, Sang-Hee Ko Park, Myung-Kwan Ryu, Sang-Yoon Lee, and Jae Kyeong Jeong, IEEE ELECTRON DEVICE LETTERS, 31, 12 (2010)
- Sang Yeol Lee, Do Hyung Kim, Eugene Chong, Yong Woo Jeon, and Dae Hwan Kim, Appl. Phys. Lett. 98, 122105 (2011) https://doi.org/10.1063/1.3570641
- 김한기, 이지면, 전기전자재료학회지 21, No2., 15 (2008)
- 김일두, 홍재민, 전기전자재료학회지 21, No.2., 27 (2008)
- 신선호, 전기전자재료학회지 21, No.1., 05 (2008)