Transactions on Electrical and Electronic Materials

  • 제12권5호
  • /
  • Pages.189-192
  • /
  • 2011
  • /
  • 1229-7607(pISSN)
  • /
  • 2092-7592(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지
DOI QR코드

DOI QR Code

Optical Characteristics of a Flexible Back-Light Unit with Plasma Discharge Clusters

  • Goo, Gyo-Uk (Department of Advanced Materials Engineering, Korea Polytechnic University) ;
  • Ryu, Si-Hong (Department of Advanced Materials Engineering, Korea Polytechnic University) ;
  • Lee, Seung-Eui (Department of Advanced Materials Engineering, Korea Polytechnic University) ;
  • Ahn, Sung-Il (Department of Engineering in Energy and Applied Chemistry, Center for Green Fusion Technology, Silla University)
  • 투고 : 2011.01.01
  • 심사 : 2011.06.14
  • 발행 : 2011.10.25
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

A flexible back-light unit (FBLU) is fabricated by embedding plasma discharge clusters in a flexible polymer matrix. The brightness uniformity of an FBLU was measured for various combinations of optical sheets and compared with the simulated results for various bending angles. A gap between light sources causes distinctive integrated brightness curves which have two inflection points depending on bending angle. The brightness distribution of a simulated BLU was in good agreement with that of an actual plasma BLU except for a dark area that appeared at the center of the simulated BLU. The real and simulated BLUs both clearly showed an angle dependency caused by mirror images located between point light sources. On the basis of these results, it is suggested that these mirror-like images could be a major factor in determining the characteristics of FBLUs.

키워드

참고문헌

  1. C. A. Wedding, J. W. Guy, O. M. Strbik, D. K. Wedding, R. P. Wenzlaff, and W. W. Olson, SID 2004 Digest of Technical Books 35, 815 (2004).
  2. L. Meng, S. J. Park, B. T. Cunningham, and J. G. Eden, J. Microelectromech. Syst. 16, 1397 (2007) [DOI: 10.1109/JMEMS.2006.886034].
  3. R. S. Tarighat, A. Goodarzi, S. Mohajerzadeh, B. Arvan, M. R. Gaderi, and M. Fathipour, Proc. IEEE 93, 1374 (2005) [DOI: 10.1109/JPROC.2005.851258].
  4. H. Hirakawa, K. Shinohe, Y. Yamazaki, M. Ishimoto, K. Awamoto, and T. Shinoda, SID 2008 Digest of Technical Books 39, 480 (2008).
  5. Y. K. Lee, S. T. Heo, Y. K. Lee, and D. G. Lee, Trans. Electri. Electron. Mater. 11, 186 (2010) [DOI: 10.4313/TEEM.2010.11.4.186].
  6. S. H. Kim, G. U. Goo, S. E. Lee, and S. I. Ahn, Thin Solid Films 518, 6654 (2010) [DOI: 10.1016/j.tsf.2010.01.054].
  7. S. H. Ryu, S. E. Lee, S. I. Ahn, and K. C. Choi, IMID'07, 1388 (2007).
  8. S. I. Ahn, H. Uchiike, S. E. Lee, K. Kim, and S. J. Kwon, Jpn. J. Appl. Phys. 46, 6022 (2007) [DOI: 10.1143/JJAP.46.6022].
  9. J. M. Han, J. W. Han, and D. S. Seo. Trans. Electri. Electron. Mater. 9, 16 (2008) [DOI: 10.4313/TEEM.2008.9.1.016].

피인용 문헌

  1. A Study on Blue Light Blocking Performance and Prescription for Blue Light Blocking Lens vol.18, pp.3, 2013, https://doi.org/10.14479/jkoos.2013.18.3.297
  2. Dry etch properties of IZO thin films in a CF4/Ar adaptively coupled plasma system vol.86, pp.9, 2012, https://doi.org/10.1016/j.vacuum.2011.12.020