AMOLED용 산화물 TFT 기술

  • 박상희 (한국전자통신연구원 융합부품소재연구부문 신소자/소재연구부 산화물전자소자연구팀)
  • Published : 2011.08.31

Abstract

Keywords

References

  1. T. Kamiya, K. Nomura, M. Hirano, and H. Hosono, Phys. Status Solid c, 5, 3098 (2008). https://doi.org/10.1002/pssc.200779300
  2. Kamiya T, Nomura K and Hosono H. Phys. Status Solidi a, 206, 860 (2009). https://doi.org/10.1002/pssa.200881303
  3. Kamiya T and Hosono H NPG Asia Mater. 2 1522 (2010).
  4. Kamiya T, Nomura K and Hosono H. Disp. Technol.,5, 462 (2009). https://doi.org/10.1109/JDT.2009.2022064
  5. Suresh A and Mutha J. F. Appl. Phys. Lett. 92, 033502 (2008). https://doi.org/10.1063/1.2824758
  6. D.-H. Cho,S Yang, C. Byun, J. Shin, M. K. Ryu,S.-H. K. Park, C.-S. Hwang, S. M. Chung, W.-S. Cheong, S. M. Yoon, and H.-Yo. Chu, Appl. Phys. Lett. 93, 142111 (2008). https://doi.org/10.1063/1.2998612
  7. S.-H. K. Park, C.-S. Hwang, M. Ryu, S. Yang, C. Byun, J. Shin, J.-I. Lee, K. Lee, M. S. Oh, and S. Im, Adv. Mater., 21,678 (2009). https://doi.org/10.1002/adma.200801470
  8. J.-H. Shin, J.-S. Lee, C.-S. Hwang, S.-H. K. Park, W.-S. Cheong, M. Ryu, C.-W, Byun, J.-l. Lee and H. Y. Chu, ETRI Journal, 31, 62 (2009). https://doi.org/10.4218/etrij.09.0208.0266
  9. J. Lee, J.-S. Park, Y. S. Pyo, D. B. Lee, E. H. Kim,D. Stryakhilev, T. W. Kim, D. U. Jin, and Y.-G. Mo, Appl. Phys. Lett. 95, 123502 (2009). https://doi.org/10.1063/1.3232179
  10. S.-H. K. Park, D.-H. Cho, C.-S. Hwang, M. Ryu, S. Yang, C. Byun, S. M. Yoon, W.-S. Cheong,and K. I. Cho, IMID Digest, 385 (2009).
  11. M. K. Ryu, S. Yang, S.-H. K. Park, C.-S. Hwang, and J. K. Jeong, Appl. Phys. Lett. 95, 173508 (2009). https://doi.org/10.1063/1.3257726
  12. E. Fukumoto, T. Arai, N. Morosawa, K. Tokunaga, Y. Terai, T. Fujimori and T. Sasaoka, IDW '10, 631 (2010).
  13. T. Arai, N. Morosawa, K. Tokunaga, Y. Terai, E. Fukumoto, T. Fujimori, T. Nakayama, T. Yamaguchi and T. Sasaoka, SID 10 DIGEST . 1033 (2010).
  14. P. S. Yun, M. Naito, R. Kumagai, Y. Sutou and J. Koike, SID 11 DIGEST . 1177 (2011).
  15. R. Hayashi, A. Sato, M. Ofuji, K. Abe, H. Yabuta, M. Sano, and H. Kumomi, SID 08 DIGEST . 621 (2008)
  16. N. Morosawa, Y. Ohshima, M. Morooka, T. Arai and T. Sasaoka, SID 11 DIGEST, 479 (2011).
  17. T. Kamiya1, K. Nomura, and H. Hosono, Sci. Technol. Adv. Mater. 11, 044305 (2010). https://doi.org/10.1088/1468-6996/11/4/044305
  18. B. Ryu, H.-K. Noh, E.-A. Choi, and K. J. Chang, Appl. Phys. Lett. 97, 022108 (2010). https://doi.org/10.1063/1.3464964