The Transactions of the Korean Institute of Electrical Engineers P (전기학회논문지P)

The Korean Institute of Electrical Engineers (대한전기학회)
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Ionization and Attachment Coefficients in CF4

CF4 기체에서의 전리와 부착계수

  • 김상남 (인천대학교 전기공학과)
  • Received : 2011.01.11
  • Accepted : 2011.02.22
  • Published : 2011.03.01
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Abstract

In this paper, the electron transport characteristics in $CF_4$ has been analysed over the E/N range 1~300[Td] by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been calculated to give swarm parameters for the electron drift velocity, longitudinal diffusion coefficient, the ratio of the diffusion coefficient to the mobility, electron ionization and attachment coefficients, effective ionization coefficient, mean energy, collision frequency and the electron energy distribution function. The electron energy distribution function has been analysed in $CF_4$ at E/N=5, 10, 100, 200 and 300[Td] for a case of the equilibrium region in the mean electron energy and respective set of electron collision cross sections. The results of Boltzmann equation and Monte Carlo simulation have been compared with experimental data by Y. Nakamura and M. Hayashi. The swarm parameter from the swarm study are expected to serve as a critical test of current theories of low energy electron scattering by atoms and molecules, in particular, as well as crucial information for quantitative simulations of weakly ionized plasmas.

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References

  1. Stephen M. Rossnagel, Jerpome J. Cuomo, William D Westwood, "Handbook of Plasma Processing Technology", Noyes Publications, 1990.
  2. L. G. Christophorou, S. R. Hunter, J. G. Carter and R. A. Mathis, "Gases for possible use in diffuse -discharge switches",Appl. Phys. Lett. 4, pp. 147- 149, 1982.
  3. H. Itoh, M. Inomata, T. Matsumura, K. Satoh, Y. Suzuki, Y. Nakao, H. Tagashira,"Electron Swarm Characteristics in Gas Mixtures Containing $CF_4$", T. IEE Japan, Vol.116-A, No. 4, pp.328-333, 1996.
  4. 菅野卓雄 編著, "半導体プラズマプロセス技術", 産業圖書, pp.38-50, 1993.
  5. 山本, 生田,"モンテカルロシミユレーツヨンによる$CF_4$カスの電子衝突 斷面績", 電氣學會放電硏究會資料, ED-92-101, pp.71-80, 1992.
  6. "モンテカルロ法と シミユレーツヨン", 培風館, 1989.
  7. 電氣學會技術報告, "氣體放電 シミユレーツヨン技法", 第140号, 1974.
  8. 中村, 富澤, 電氣學會放電硏究會資料,"$CF_4$氣體における 電子輸送係數の測定", ED-88-58, pp.29-37, 1988.
  9. Y. Nakamura and M. Kurachi, "Electron Transport Parameters in Argon and its momentum transfer cross section" J. Phys. 21, pp.718-723, 1988.
  10. M. Hayashi,"Swarm Studies and Inelastic Electron -Molecule Collisions", L. C. Pitchford, Springer- Verlag, 1986.
  11. C. Jacoboni and P. Lugli, "The Monte Carlo Method for Semiconductor Device Simulation", Springer -Verlag Wien, pp.1-4, 1989.
  12. 倉知 正, "$SiH_4$-希カス混合氣體中における電子輸送係數に關する硏究", 慶応義塾大學大學院 理工學硏究室修士學位 論文, 1986.
  13. Philip. E. Luft, "Description of a Backward prolongation program for computing transport coefficients", JILA. information center report, No.19, 1975.
  14. Brian Chapman, "Glow Discharge Processes", John Wiley & Sons, 1980.
  15. 山本, 生田, "$CF_4$カスの電子衝突斷面績と輸送係數", 電氣學會放電硏究會資料, ED-91-70, pp.11-20, 1991.
  16. M. G. Curtis, Isobel C. Walker and K. J. Mathieson, "Electron Swarm Characteristic Energies(Dr/$\mu$) in Tetrafluoromethane($CF_4$) at Low E/N", IOP Publishing Ltd, pp.1271-1274, 1988.
  17. 松村, 伊達, 田頭, 電氣學會放電硏究會資料 ED-92-97, pp.31-39, 1992.
  18. 金相南, "시뮬레이션에 의한 $CF_4,\;CH_4$, Ar 混合氣體에서 電子 에너지分布函數" 大韓電氣學會 論文集, 52P-1-2 pp.9-13, 2003
  19. 金相南, "$SiH_4-Ar$ 混合氣體의 電子分布函數 解析" 大韓電氣學會 論文集 53P-1-2. pp 65-69, 2004