DOI QR코드

DOI QR Code

Effect of Electrolyte Compositions on the Physical Property and Surface Morphology of Copper Foil

전해액 조성에 의한 구리 박막의 표면형상과 물성변화

  • Woo, Tae-Gyu (Division of Advanced Materials Engineering, College of Engineering, Chonbuk National University) ;
  • Park, Il-Song (Division of Advanced Materials Engineering, College of Engineering, Chonbuk National University) ;
  • Jeon, Woo-Yong (Department of Dental Technology, Kwang Yang Health College) ;
  • Park, Eun-Kwang (Division of Advanced Materials Engineering, College of Engineering, Chonbuk National University) ;
  • Jung, Kwang-Hee (Division of Advanced Materials Engineering, College of Engineering, Chonbuk National University) ;
  • Lee, Hyun-Woo (Division of Advanced Materials Engineering, College of Engineering, Chonbuk National University) ;
  • Lee, Man-Hyung (Division of Advanced Materials Engineering, College of Engineering, Chonbuk National University) ;
  • Seol, Kyeong-Won (Division of Advanced Materials Engineering, College of Engineering, Chonbuk National University)
  • 우태규 (전북대학교 공과대학 신소재공학부) ;
  • 박일송 (전북대학교 공과대학 신소재공학부) ;
  • 전우용 (광양보건대학 치기공과) ;
  • 박은광 (전북대학교 공과대학 신소재공학부) ;
  • 정광희 (전북대학교 공과대학 신소재공학부) ;
  • 이현우 (전북대학교 공과대학 신소재공학부) ;
  • 이만형 (전북대학교 공과대학 신소재공학부) ;
  • 설경원 (전북대학교 공과대학 신소재공학부)
  • Received : 2010.03.23
  • Published : 2010.10.22

Abstract

This study examined the effect of copper and sulfuric acid concentrations on the surface morphology and physical properties of copper plated on a polyimide (PI) film. Electrochemical experiments with SEM and a four-point probe were performed to characterize the morphology and mechanical characteristics of copper electrodeposited in the composition of an electrolyte. The resistivity and peel strength were controlled using a range of electrolyte compositions. A lower resistivity and high flexibility were obtained when an electrolyte with 20 g/l of copper was used. However, a uniform surface was obtained when a high current density that exceeded $20mA/cm^2$ was applied, which was maintained at copper concentrations exceeding 40 g/l. Increasing sulfuric acid to >150 g/l decreased the peel strength and flexibility. The lowest resistivity and fine adhesion were detected at a $Cu^{2+}:H_2SO_4$ ratio of 50:100 g/l.

Keywords

References

  1. T. G. Chung, Y. H. Kim, and J. G. Na, J. Kor. Inst. Met. & Mater. 29, 1097 (1991).
  2. K. H. Hwang, K. I. Lee, S. K. Joo, and T. Kang, J. Kor. Associ. Cryst. Grow. 1 80 (1991).
  3. S. M. Sze, VLSI Technology, 2nd Ed., NcGraw Hill, p. 373 (1988).
  4. G. E. McGuire, Semiconductor Materials and Process Handbook, Noyes Publication, p. 587 (1988).
  5. E. J. Lee and J. S. Kim, J. Inst. Ind. Technol. 6, 11 (1998).
  6. J. J. Kim and M. S. Kang, Hwahak Konghak 39, 721 (2001).
  7. B. S. Min, W. S. Chung, and I. G. Kim, J. Kor. Inst. Met. & Mater. 40, 12 (2002).
  8. S. Yoshimura, S. Yoshihara, T. Shirakashi, and E. Sato, Electrochim. Acta 39, 589 (1994). https://doi.org/10.1016/0013-4686(94)80105-3
  9. T. X. Liang, Y. Q. Liu, Z. Q. Fu, T. Y. Luo, and K. Y. Zhang, Thin Solid Films 473, 247 (2005). https://doi.org/10.1016/j.tsf.2004.07.073
  10. E. K. Park, M. H. Lee, T. G. Woo, I. S. Park, K. H. Jung, and K. W. Seol, J. Kor. Inst. Met. & Mater. 47, 740 (2009).
  11. M. L. Sartorelli, A. Q. Schervenski, R. G. Delatorre, and P. Klauss, Phys. Stat. Sol. 187, 91 (2001). https://doi.org/10.1002/1521-396X(200109)187:1<91::AID-PSSA91>3.0.CO;2-9
  12. T. G. Woo, I. S. Park, H. W. Lee, and K. W. Seol, Kor. J. Mater. Res. 16, 11 (2006). https://doi.org/10.3740/MRSK.2006.16.1.011
  13. H. J. Kang, P. N. Park, S. J. Park, and S. Y. Choi, Electro. Technol. Res. 203, 8 (2003).
  14. P. V. Brande and R. Winand, Surf. Coat. Technol. 52, 1 (1992). https://doi.org/10.1016/0257-8972(92)90365-H
  15. Z. Zhou and T. J. O'Keefe, J. Appl. Electroch. 28, 461 (1998). https://doi.org/10.1023/A:1003209009910
  16. J. J. Yang, Y. L. Huang, and K. W. Xu, Surf. Coat. Technol. 201, 5574 (2007). https://doi.org/10.1016/j.surfcoat.2006.07.227
  17. A. Ibanez and E. Fatas, Surf. Coat. Technol. 191, 7 (2005). https://doi.org/10.1016/j.surfcoat.2004.05.001
  18. H. S. Lee, H. S. Kim, and C. M. Lee, J. Kor. Inst. Met. & Mater. 39, 920 (2001).
  19. H. S, Lee, D. K. Kwon, H. A. Park, and C. M. Lee, Kor. J. Mater. Res. 13, 174 (2003). https://doi.org/10.3740/MRSK.2003.13.3.174
  20. C. H. Yang, S. C. Lee, J, M. Wu, and T. C. Lin, Appl. Surf. Sci. 252, 1818 (2005). https://doi.org/10.1016/j.apsusc.2005.03.182
  21. H. T. Yeom and J. S. Lee, Surf. Treat. Plat., p. 49-58, Munundang, Seoul (2008).