Improvement of Ion Beam Resolution in FIB Process by Selective Beam Blocking

선택적 빔 차단을 통한 집속이온빔 가공 정밀도 향상

  • Han, Min-Hee (School of Mechanical Engineering, Yonsei Univ.) ;
  • Han, Jin (School of Mechanical Engineering, Yonsei Univ.) ;
  • Kim, Tae-Gon (School of Mechanical Engineering, Yonsei Univ.) ;
  • Min, Byung-Kwon (School of Mechanical Engineering, Yonsei Univ.) ;
  • Lee, Sang-Jo (School of Mechanical Engineering, Yonsei Univ.)
  • 한민희 (연세대학교 기계공학과) ;
  • 한진 (연세대학교 기계공학과) ;
  • 김태곤 (연세대학교 기계공학과) ;
  • 민병권 (연세대학교 기계공학과) ;
  • 이상조 (연세대학교 기계공학과)
  • Received : 2009.12.31
  • Accepted : 2010.04.23
  • Published : 2010.08.01

Abstract

In focused ion beam (FIB) fabrication processes the ion beam intensity with Gaussian profile has a drawback for high resolution machining. In this paper, the fabrication method to modify the beam profile at substrate using silt mask is proposed to increase the machining resolution at high current. Slit mask is utilized to block the part of beam and transmit only high intensity portion. A nano manipulator is utilized to handle the silt mask. Geometrical analysis on fabricated profile through silt mask was conducted. By utilizing proposed method, improvement of machining resolution was achieved.

Keywords

Acknowledgement

Grant : 고효율 에너지빔 응용 초미세 부품 제조용 In-line 시스템 개발

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