열처리공학회지 (Journal of the Korean Society for Heat Treatment)

  • 제23권2호
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  • Pages.69-74
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  • 2010
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  • 1225-1070(pISSN)
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  • 2508-4046(eISSN)
한국열처리공학회 (The Korean Society for Heat Treatment)
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A Study on the Fabrication and Structural Evaluation of AlN Thin Films

  • Han, Seung-Oh (Institute of Fusion Technology, Hoseo University) ;
  • Han, Chang-Suk (Dept. of Defense Science & Technology, Hoseo University)
  • 투고 : 2010.01.04
  • 심사 : 2010.02.17
  • 발행 : 2010.03.30
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초록

AlN thin films were deposited by using a two-facing-targets type sputtering system (TFTS), and their deposition characteristics, microstructure and texture were investigated. Total gas pressure was kept constant at 0.4 Pa and the partial pressures of nitrogen, $PN_2$ (($N_2$ pressure)/($Ar+N_2$ pressure)) varied from 0 to 0.4 Pa. The texture of the film cross-sections and surface morphology were observed by field emission scanning electron microscope (FE-SEM). The crystallographic orientation of the films were analyzed by X-ray diffraction (XRD). Deposition of AlN film depends on $N_2$ partial pressure. The best preferred oriented AlN thin films can be deposited at a nitrogen partial pressure of $PN_2$ = 0.52. As-deposited AlN films show preferred orientation and columnar structure, and the grAlN size of AlN films increases with increasing sputtering current.

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참고문헌

  1. A. Mahmood, N. Rakov and M. Xiao : Mater. Lett., 57 (2003) 1925. https://doi.org/10.1016/S0167-577X(02)01106-0
  2. Z. An, C. Men and Z. Xu : Surf. & Coat. Tech., 196 (2005) 130. https://doi.org/10.1016/j.surfcoat.2004.08.169
  3. C. L. Aardahl, H. K. Yun and Y. Ono : Thin Solid Films, 346 (1999) 174. https://doi.org/10.1016/S0040-6090(98)01618-6
  4. K. S. Kao, C. C. Cheng and Y. C. Chen : Appl. Ferroelect., Proc. 13th IEEE Int.- Symp. (2002) 403.
  5. L. Zhang, E. F. McCullen and M. H. Rahman : Sensors & Actuators. B, 113 (2006) 843.
  6. E. A. Chowdhury, J. Kolodzey and J.O. Olowolafe : Appl. Phys. Lett., 70 (1997) 2732. https://doi.org/10.1063/1.118980
  7. X. D. Wang, K. W. Hipps and J. T. Dickinson: J. Mater. Res., 9 (1994) 1449. https://doi.org/10.1557/JMR.1994.1449
  8. Y. Hara, N. Kitazawa and Y. Watanabe : Ceramic Soc. of Japan, (1999) 464.
  9. X. Li, X. Xu and H. Wu : J. Inorg. Mater., 20 (2005) 1481.
  10. X. Q. Shen, Y. Tanizu and T. Ide : Phys. Status Solidi. C, Conf. & Critical Rev., 7 (2003) 2511.
  11. T. Kitahara, N. Ichikawa and Y. Nomoto : Vacuum, 82 (2007) 109. https://doi.org/10.1016/j.vacuum.2006.12.006
  12. K. Hara, A. Sato and K. Azumada : Phys. Status Solidi. C, Conf. & Critical Rev., 7 (2003) 2274.
  13. H. E. Cheng, T. C. Lin and W. C. Chen: Thin Solid Films, 425 (2003) 85. https://doi.org/10.1016/S0040-6090(02)01137-9
  14. N. Rakov, A. Mahmood and M. Xiao : Scripta Mater., 50 (2004) 589. https://doi.org/10.1016/j.scriptamat.2003.11.034
  15. A. Mahmood, N. Rakov and M. Xiao : Mater. Lett., 57 (2003) 1925. https://doi.org/10.1016/S0167-577X(02)01106-0
  16. D. Manova, V. Dimitrova and W. Fukarek : Surf. & Coat. Tech., 106 (1998) 205. https://doi.org/10.1016/S0257-8972(98)00527-1
  17. J. A. Ruffner, P. G. Clem and B. A. Tuttle: Thin Solid Films, 354 (1999) 256. https://doi.org/10.1016/S0040-6090(99)00521-0