Journal of the Optical Society of Korea

  • 제14권3호
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  • Pages.266-276
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  • 2010
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  • 1226-4776(pISSN)
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  • 2093-6885(eISSN)
한국광학회 (Optical Society of Korea)
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Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

  • 투고 : 2010.08.02
  • 심사 : 2010.08.27
  • 발행 : 2010.09.25
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초록

In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 ${\mu}m$ resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 ${\mu}m$ line width.

키워드

참고문헌

  1. D. Dudley, W. Duncan, and J. Slaughter, “Emerging digital micromirror device (DMD) applications,” Proc. SPIE 4985, 14-29 (2003). https://doi.org/10.1117/12.480761
  2. R. Hofling and E. Ahl, “ALP: universal micromirror controller for metrology and testing,” Proc. SPIE 5289, 322-329 (2004). https://doi.org/10.1117/12.528336
  3. W. Mei, T. Kanatake, and A. Ishikawa, “Moving exposure system and method for maskless lithography system,” U.S. Patent 6,379,867 B1 (2002).
  4. W. Mei, “Point array maskless lithography,” U.S. Patent 6,473,237 B2 (2002).
  5. A. Beeker, W. Cebuhar, J. Kreuzer, A. Latypov, and Y. Vladimirsky, “Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region,” U.S. Patent 6,876,440 B1 (2005).
  6. K. F. Chan, Z. Feng, R. Yang, A. Ishikawa, and W. Mei, “High-resolution maskless lithography,” Journal of Microlithography, Microfabrication, and Microsystems 2, 331-339 (2003). https://doi.org/10.1117/1.1611182
  7. T. Kanatake, “High resolution point array,” U.S. Patent 6,870,604 B2 (2005).
  8. M. Seo and H. Kim, “Occupancy based pattern generation method for maskless lithography,” Patent KR 10-0655165 (2006), Patent Application Pub. No. US/12/095,037 (2008).
  9. R. Menon, A. Patel, D. Chao, M. Walsh, and H. Smith, “Zone-plate-array lithography (ZPAL): optical maskless lithography for cost-effective patterning,” Proc. SPIE 5751, 330-339 (2005). https://doi.org/10.1117/12.598742
  10. G. Seitz, S. Schulte, U. Dinger, O. Hocky, B. Fellner, and M. Rupp, “EUV microlithography: a challenge for optical metrology,” Proc. SPIE 5533, 20-26 (2004). https://doi.org/10.1117/12.556317
  11. C. Sun, N. Fang, D. Wu, and X. Zhang, “Projection microstereolithography using digital micro-mirror dynamic mask,” Sens. Actuators A 121, 113-120 (2005). https://doi.org/10.1016/j.sna.2004.12.011
  12. M. Seo and H. Kim, “Lithography upon micromirrors,” Computer Aided Design 39, 202-217 (2007). https://doi.org/10.1016/j.cad.2006.05.007
  13. W. J. Smith, Modern Lens Design, 2nd ed. (McGraw-Hill Professional, New York, USA, 2004), Chapter 12.
  14. J. U. Lee and S. M. Yu, “Analytic design procedure of three-mirror telescope corrected for spherical aberration, coma, astigmatism, and Petzval field curvature,” J. Opt. Soc. Korea 13, 184-192 (2009). https://doi.org/10.3807/JOSK.2009.13.2.184
  15. S. C. Park, S. H. Lee, and J. G. Kim, “Compact zoom lens design for a 5x mobile camera using prism,” J. Opt. Soc. Korea 13, 206-212 (2009). https://doi.org/10.3807/JOSK.2009.13.2.206
  16. Y. Matsui, Lens Sekkeiho (The Method of Lens Design, witten in Japanese), 1st ed. (Kyoritsu Publication Inc., Tokyo, Japan, 1972), pp. 70-75.
  17. T. Kusakawa, Lens Kogaku (Lens optics, witten in Japanese), 1st ed. (Tokai Univ. Press, Tokyo, Japan, 1988), pp. 218-259.
  18. H. A. Buchdahl, Optical Aberration Coefficients, 1st ed. (Dover Publication Inc., New York, USA, 1968).
  19. R. W. Daniels, An Introuction to Numerical Methods and Optimization Techniques, 1st ed. (North-Holland, New York, USA, 1978), Chapter 8.
  20. M. Seo and H. Kim, “Digital photofabrication method and system,” in Proc. 2010 International Symposium on Flexible Automation (Tokyo, Japan, Jul. 2010), paper OS6.

피인용 문헌

  1. In Situ Fluorescence Optical Detection Using a Digital Micromirror Device (DMD) for 3D Cell-based Assays vol.16, pp.1, 2012, https://doi.org/10.3807/JOSK.2012.16.1.042
  2. Forming a Fresnel Zone Lens: Effects of Photoresist on Digital-micromirror-device Maskless Lithography with Grayscale Exposure vol.16, pp.2, 2012, https://doi.org/10.3807/JOSK.2012.16.2.127
  3. Maskless fabrication of three-dimensional microstructures with high isotropic resolution: practical and theoretical considerations vol.50, pp.16, 2011, https://doi.org/10.1364/AO.50.002383
  4. Experimental analysis of pattern line width in digital maskless lithography vol.11, pp.2, 2012, https://doi.org/10.1117/1.JMM.11.2.023004
  5. Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography vol.16, pp.3, 2012, https://doi.org/10.3807/JOSK.2012.16.3.221
  6. Detecting Digital Micromirror Device Malfunctions in High-throughput Maskless Lithography vol.17, pp.6, 2013, https://doi.org/10.3807/JOSK.2013.17.6.513
  7. The Design of Telecentric Lenses and Fly-eye Lenses by Utilizing fθ Formula vol.24, pp.1, 2013, https://doi.org/10.3807/KJOP.2013.24.1.009
  8. On-Demand Isolation and Manipulation of C. elegans by In Vitro Maskless Photopatterning vol.11, pp.1, 2016, https://doi.org/10.1371/journal.pone.0145935
  9. An automated focusing method for a parallel micro-manipulator alignment vol.22, pp.6, 2016, https://doi.org/10.1007/s00542-016-2865-8
  10. Scanning digital lithography providing high speed large area patterning with diffraction limited sub-micron resolution vol.28, pp.7, 2018, https://doi.org/10.1088/1361-6439/aabb1f