한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제43권6호
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  • Pages.266-271
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  • 2010
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  • 1225-8024(pISSN)
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  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지
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Copper 함량에 따른 Mo-Cu-N 박막의 미세구조 변화에 대한 연구

Effect of Copper Content on the Microstructural Properties of Mo-Cu-N Films

  • 신정호 (부산대학교 재료공학부) ;
  • 최광수 (부산대학교 재료공학부) ;
  • 왕계민 (부산대학교 하이브리드소재 솔루션 국가핵심연구센터) ;
  • 김광호 (부산대학교 재료공학부)
  • Shin, Jung-Ho (School of Materials Science and Engineering, Pusan National University) ;
  • Choi, Kwang-Soo (School of Materials Science and Engineering, Pusan National University) ;
  • Wang, Qi-Min (National Core Research Center for Hybrid Materials Solution, Pusan National University) ;
  • Kim, Kwang-Ho (School of Materials Science and Engineering, Pusan National University)
  • 투고 : 2010.11.04
  • 심사 : 2010.12.30
  • 발행 : 2010.12.31
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초록

Ternary Mo-Cu-N films were deposited on Si wafer substrates with various copper contents by magnetron sputtering method using Mo target and Cu target in $Ar/N_2$ gaseous atmosphere. As increasing $N_2$ pressure, the microstructure of Mo-N films changed from ${\gamma}-Mo_2N$ of (111) having face-centered-cubic (FCC) structure to $\delta$-MoN of (200) having hexagonal structure. Detailed the microstructures of the Mo-Cu-N coatings were studied by X-ray diffraction, scanning electron microscopy and field emission transmission electron microscope. The results indicated that the incorporation of copper into the growing Mo-N coating led to the $Mo_2N$ and MoN crystallites were more well-distributed and refined and the copper existed in grain boundary. Ternary Mo-Cu-N films had a composite microstructure of the nanosized crystal crystalline ${\gamma}-Mo_2N$ and $\delta$-MoN surrounded by amorphous $Cu_3N$ phase.

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