Macromolecular Research

The Polymer Society of Korea (한국고분자학회)
권호 표지

Preparation of a Superhydrophobic Film with UV Imprinting Technology

  • Choi, Young-Wook (Display Material Division, Cheil Industries Inc) ;
  • Han, Jung-Eun (R&D Center, LG Micron) ;
  • Lee, Song-Yi (Department of Chemistry & Research Institute for Natural Science, Hanyang University) ;
  • Sohn, Dae-Won (Department of Chemistry & Research Institute for Natural Science, Hanyang University)
  • Published : 2009.10.25
Download PDF
⟨ Previous Next ⟩

Abstract

Keywords

References

  1. C. Neinhuis and W. Barthlott, Ann. Bot., 79, 667 (1997) https://doi.org/10.1006/anbo.1997.0400
  2. W. Barthlott and C. Neinhuis, Planta, 202, 1 (1997) https://doi.org/10.1007/s004250050096
  3. J. L. Zhang, J. A. Li, and Y. C. Han, Macromol. Rapid Commun.,25, 1105 (2004) https://doi.org/10.1002/marc.200400065
  4. A. Singh, L. Steely, and H. R. Allcock, Langmuir, 21, 11604 (2005) https://doi.org/10.1021/la052110v
  5. W. Ming, D. Wu, R. van Benthem, and G. de Width, Nano Lett., 5, 2298 (2005) https://doi.org/10.1021/nl0517363
  6. G. R. J. Artus, S. Jung, J. Zimmermann, K. Marquardt, and S. Seegr, Adv. Mater., 18, 2758 (2006) https://doi.org/10.1002/adma.200502030
  7. L. Feng, S. Li. Y. Li, H. Li, L. Zhang, Y. Song, B. Liu, L. Jiang, and D. Zhu, Adv. Mater., 14, 1857 (2002) https://doi.org/10.1002/adma.200290020
  8. T. Sun, L. Feng, X. Gao, and L. Jiang, Acc. Chem. Res., 38, 644 (2005) https://doi.org/10.1021/ar040224c
  9. E. Hosono, S. Fujihara, I. Honma, and H. Zhou, J. Am. Chem. Soc., 127, 13458 (2005) https://doi.org/10.1021/ja053745j
  10. G. Zhang, D. Wang, Z.-Z. Gu, and H. Mohwald, Langmuir, 21, 9143 (2005) https://doi.org/10.1021/la0511945
  11. A. Nakajima, A. Fujishima, K. Hashimoto, and T. Watanabe, Adv. Mater., 11, 1365 (1999) https://doi.org/10.1002/(SICI)1521-4095(199911)11:16<1365::AID-ADMA1365>3.0.CO;2-F
  12. R. N. Wenzel, Ind. Eng. Chem., 28, 998(1936)
  13. B. D. Cassie and S. Baxter, Trans. Faraday Soc., 40, 546 (1944) https://doi.org/10.1039/tf9444000546
  14. Y.-W. Choi, J. Han, S. Eom, Y. S. Kim, J. Lee, and D. Sohn, Bull. Korean Chem. Soc., 30, 713 (2009) https://doi.org/10.5012/bkcs.2009.30.3.713
  15. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett., 67, 3114 (1996)
  16. S. Y. Chou, P. R. Krauss, and P. J. Renstorm, Science, 272, 85 (1996) https://doi.org/10.1126/science.272.5258.85
  17. L. J. Guo, Adv. Mater., 19, 495 (2007) https://doi.org/10.1002/adma.200600882
  18. D. Y. Khang, H. Kang, T. Kim, and H. H. Lee, Nano Lett., 4, 633 (2004) https://doi.org/10.1021/nl049887d
  19. J. Park, Y. S. Kim, and P. T. Hammond, Nano Lett., 5, 1347 (2005) https://doi.org/10.1021/nl050592p
  20. Y. Lu, X. Chen, W. Hu, N. Lu, J. Sun, and J. Shen, Langmuir, 23, 3254 (2007) https://doi.org/10.1021/la0632676
  21. M. Kim, K. Kim, N. Y. Lee, K. Shin, and Y. S. Kim, Chem. Commun., 23, 2237 (2007)
  22. Y. Lee, S.-H. Park, K.-B. Kim, and J.-K. Lee, Adv. Mater., 19, 2330 (2007) https://doi.org/10.1002/adma.200700820
  23. G. Y. Jung, Z. Y. Li, W. Wu, Y. Chen, D. L. Olynick, S. Y. Wang, W. M. Tong, and R. S. Williams, Langmuir, 21, 1158 (2005) https://doi.org/10.1021/la0476938
  24. H. Schift, S. Saxer, S. Park, C. Padeste, U. Pieles, and J. Gorbrecht, Nanotechnology, 16, S171 (2005) https://doi.org/10.1088/0957-4484/16/5/007
  25. L. Zhai, F. C. Cebeci, R. E. Cohen, and M. F. Rubner, Nano Lett., 4, 1349 (2004) https://doi.org/10.1021/nl049463j
  26. W. Chen, A. Y. Fadeev, M. C. Hsieh, D. Oner, J. Youngblood, and T. J. McCarthy, Langmuir, 15, 3395 (1999) https://doi.org/10.1021/la990074s
  27. G. R. J. Artus, J. Stefan, Z. Jan, H.-P. Gautschi, K. Marquarde, and S. Seeger, Adv. Mater., 18, 2758 (2006) https://doi.org/10.1002/adma.200502030