참고문헌
- Y. Segui and Buiai, Gas Discharge in Hexamethyldisiloxane, J. Appl. Polym. Sci., 20, 1611(1976) https://doi.org/10.1002/app.1976.070200618
- A. M. Wrobel, M. Kryszewski and M. Gazicki, Structure of Glow Discharge Polysilazane Thin Films, Polymer, 17, 678(1976) https://doi.org/10.1016/0032-3861(76)90207-X
- A. M. Wrobel, M. R. Wertheimer, J. Dib, and H. P. Schreiber, Polymerization of Organosilicones in Microwave Discharges, J. Macromol. Sci. Chem., A14(3), 321(1980) https://doi.org/10.1080/00222338008056716
- Ichiro Tajima and Minoru Yamamoto, Spectroscopic Study on Chemical Structure of Plasma-Polymerized Hexamethyldisiloxane, J. Polym. Sci., Polym. Chem. Ed., 23, 615(1985) https://doi.org/10.1002/pol.1985.170230303
- I. H. Coopes and H. J. Griesser, The Structure of Organosilicon Plasma-Polymerized Coatings of Metal Substrates, J. Appl. Polym. Sci., 37, 3413(1989) https://doi.org/10.1002/app.1989.070371212
- F. Kokaki, T. Kubota, M. Ichiyo, and K. Wakai, Plasma Diagnostics and Structure of Plasma Polymers of Tetramethylsilane, J. Appl. Polym. Sci., Appl. Polym. Symp., 42, 197(1988)
- Shide Cai, Jianglin Fang, and Xuehai Yu, Plasma Polymerization of Organosiloxanes, J. Appl. Polym. Sci., 44, 135(1992) https://doi.org/10.1002/app.1992.070440114
- Guneri Akovali, Zakir M. O. Rzaev and D. G. Mamedov, Plasma Surface Modification of Polyethylene with Organosilicon and Organotin Monomers, Eur. Polym. J., 32(3), 375(1996) https://doi.org/10.1016/0014-3057(95)00069-0
-
Shashank C. Deshmukh and Eray S. Aydil, Investigation of Low Temperature
$SiO_{2}$ Plasma Enhanced Chemical Vapor Deposition, J. Vac. Sci. Technol., B14(2), 738(1996) - Harold F. Winters, et al., Coatings and Surface Modification Using Low Pressure Non-Equilibrium Plasmas, Material Science and Engineering, 70, 53(1985) https://doi.org/10.1016/0025-5416(85)90268-X
- G. Beamson, W. J. Brennan, D. K. Clark, and J. Howard, Modification of Surfaces and Surface Layers by Non Equilibrium Processes, Physica Scripta., T23, 249(1988) https://doi.org/10.1088/0031-8949/1988/T23/047
- V. Dusek, and J. Musil, Microwave Plasmas in Surface Treatment Technologies, Czech. J. Phys., 40, 1185(1990) https://doi.org/10.1007/BF01605048
- D. Korzec, K. Traub, F. Werner, and J. Engemann, Remote deposition of scratch resistant films by use of slot Antenna microwave plasma sources, Thin Solid Films, 143, 281(1996) https://doi.org/10.1016/0040-6090(96)08595-1
- Yasumi Yamada, Shigeru Tasaka, and Norihiro Inagaki, Effect of Remote Oxygen-Plasma for SiOx Film Preparation, Kobunshi Ronbunshu, 53(1), 33(1996) https://doi.org/10.1295/koron.53.33
- Tae Il C hun, Suk Chul Choi, Christine Taschner, Albrecht Leonhardt, Robert Kaufmann, Carsten Rehwinkel, Volker Rossbach, Surface Modification of Polytetrafluoroethylene with Tetraethoxysilane by Using Remote Argon/ Dinitrogen Oxide Microwave plasma, J. Appl. Poly. Sci., 76, 1207(2000) https://doi.org/10.1002/(SICI)1097-4628(20000523)76:8<1207::AID-APP1>3.0.CO;2-J
- Hans R. Kricheldorf, 'Silicon in Polymer Synthesis', Springer Velag, Springer Velag, Chapter 7, p.408, 1996