References
-
B. O’regan and M. Gratzel, 'A low-cost, high-efficiency solar cell based on dye-sensitized colloidal
$TiO_2$ films', Nature, vol. 353, pp. 737-740, 1991 https://doi.org/10.1038/353737a0 - M. Gawenda, A. Sperschneider, F. Schacher, G. Krausch, A. Muller, and M. Ulbricht, 'Toward nanoporous composite membranes with tailored block copolymers as selective layer', Desalination, vol. 200, pp. 29-31, 2006 https://doi.org/10.1016/j.desal.2006.03.230
-
J. Aarik, J. Karlis, H. Mandar, T. Uustare, and V. Sammelselg, 'Influence of structure development on atomic layer deposition of
$TiO_2$ thin films', Appl. Surf. Sci., vol. 181, no. 3, pp. 339-348, 2001 -
K. J. Yoon and O. S. Song, 'Property of the nano-thick
$TiO_2$ films using an ALD at low temperature', Kor. J. Mater. Res., vol. 18, no. 10, pp. 515-520, 2008 https://doi.org/10.3740/MRSK.2008.18.10.515 - T. Suntola, 'Atomic layer epitaxy', Thin Solid Films, vol. 216, no. 1, pp. 84-89, 1992 https://doi.org/10.1016/0040-6090(92)90874-B
- I. Bertoti, M. Mohai, J. L. Sullivan, and S. O. Saied, 'Surface characterisation of plasma-nitrided titanium: an XPS study', Appl. Surf. Sci., vol. 84, no. 4, pp. 357-371, 1995 https://doi.org/10.1016/0169-4332(94)00545-1
-
Y. Du, X. Du, and S.M. George, '
$SiO_2$ film growth at low temperatures by catalyzed atomic layer deposition in a viscous flow reactor', Thin Solid Films, vol. 491, no. 1, pp. 43-53, 2005 https://doi.org/10.1016/j.tsf.2005.05.051 -
V. Sammelselg, A. Rosental, A. Tarre, L. Niinisto, K. Heiskanen, K. Ilmonen, L. S. Johansson, and T. Uustare, '
$TiO_2$ thin films by atomic layer deposition: a case of uneven growth at low temperature', Appl. Surf. Sci., vol. 134, no. 1, pp. 78-86, 1998 https://doi.org/10.1016/S0169-4332(98)00224-4 -
D. U. Hong, C. H. Han, S. D. Han, J. H. Gwak, and S. Y. Lee, 'Catalytic combustion type hydrogen gas sensor using
$TiO_2$ and UV LED', J. Kor. Sensors Soc., vol. 16, no. 1, pp. 7-10, 2007 https://doi.org/10.5369/JSST.2007.16.1.007 -
D. S. Lee, S. D. Han, Y. M. Son, and D. D. Lee, 'Fabrication and NOX sensing characteristics of WO3 based thick film devices doped with
$TiO_2$ and noble metals', J. Kor. Sensors Soc., vol. 6, no. 4, pp. 274-279, 1997