Fabrication of Optically Images Using Nanostructured Photoluminescenct Porous Silicon

나노 구조를 갖는 다공성 실리콘의 광 발광성을 이용한 광학이미지 칩의 제작

Optical images based on the porous silicon exhibiting photoluminescence have been prepared from an electrochemical etching of n-type silicon wafer (boron-doped,<100> orientation, resistivity $1{\sim}10{\Omega}-cm$) by using a beam projector. The images remained in the substrate displayed an optical images correlating to the optical pattern and could be useful for optical data storage. This provides the ability to fabricate complex optical encoding in the surface of silicon.