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열간나노임프린트공정을 이용한 평판형 폴리머 소재의 선형 패턴 제작에 관한 연구

A study on Linear Pattern Fabrication of Plate-type Polymer by Using Thermal Nano Imprint Lithography Process

  • 정유나 (부산대학교 기계공학부) ;
  • 이창수 (부산대학교 정밀정형 및 금형가공 협동과정) ;
  • 윤성원 (일본산업기술종합연구소) ;
  • 강충길 (부산대학교 정밀정형 및 금형가공연구소)
  • 발행 : 2009.12.01

초록

In this work we demonstrate the hot-embossing process under different forming conditions such as forming temperature, load, and holding time in pressing, in order to determine the suitable conditions required for linear patterning on polymer plates (PC). Results showed that the replicated pattern depth increased in proportion to an increase in the forming temperature, load, and time. The reduction of the workpiece thickness increased according to the holding time in the pressing process. In the process of time, the reduction ratio of the workpiece thickness decreased due to the surface area increment of the workpiece, while the pressure on the workpiece declined. In order to reduce the bulging ratio we introduced a temperature difference between the upper and the lower punch.

키워드

참고문헌

  1. D. Hardt, B. Ganesan, W. Oi, M. Dirckx, A. Rzepniewski, Jan. 2004, Process Control in Micro-Embossing-A Review, Singapore MIT Alliance Programme(SMA) in Innovation in Manufacturing Systems and Technology(IMST)
  2. C. G Choi, 2004, Fabrication of optical waveguides in thermosetting polymers using hot embossing, J. Micromech. Microeng., Vol. 14, pp. 945-949 https://doi.org/10.1088/0960-1317/14/7/015
  3. W. S. Kim, K. B. Yoon, B. S. Bae, 2005, Nanopatterning of photonic crystals with a photocurable silica–titania organic–inorganic hybrid material by a UV-based nanoimprint technique, J. Mater. Chem., Vol. 15, pp. 4535-4539 https://doi.org/10.1039/b509622g
  4. K. Ishihara, M. Fujita, I. Matusubara, T. Asano, S. Noda, 2006, Direct Fabrication of Photonic Crystal on Glass Substrate by Nanoimprint Lithography, Japanese Journal of Applied Physics, Vol. 45, No. 7, pp. 210-212 https://doi.org/10.1143/JJAP.45.L210
  5. B. Heidari, I. Maximov, L. Montelius, 2000, Nanoimprint lithography at the 6 in. wafer scale, J. Vac. Sci. Technol. B Vol. 18, No. 6, pp. 3557-3560 https://doi.org/10.1116/1.1326923
  6. N. S. Cameron, H. Roberge, T. Veres, S. C. Jakeway, H. J. Crabtree, 2006, High fidelity, high yield production of microfluidic devices by hot embossing lithography: rheology and stiction, Lab Chip, Vol. 6, No. 7, pp. 936-941 https://doi.org/10.1039/b600584e
  7. L. J. Guo, 2004, Recent Progress in nanoimprint technology and its application, J. Pzhys. D. 37, pp. 123-141 https://doi.org/10.1088/0022-3727/37/11/R01
  8. H. C. Scheer , H. Schulz, 2001, A contribution to the flow behaviour of thin polymer films during hot embossing lithography, Microelectronic Eng., Vol. 56, pp. 311-332 https://doi.org/10.1016/S0167-9317(01)00569-X
  9. Yi-Je Juang, L. James Lee, Kurt W. Koelling, 2002, Hot Embossing in Microfabrication. Part 1: Experimental, Polym. Eng. Sci., Vol. 42, No. 3, pp.539-550 https://doi.org/10.1002/pen.10970