한국공작기계학회논문집 (Transactions of the Korean Society of Machine Tool Engineers)

한국생산제조학회 (The Korean Society of Manufacturing Technology Engineers)
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Run to Run 제어 기법을 이용한 자기연마 공정 관리

Optimization of Magnetic Abrasive Polishing Process using Run to Run Control

  • 안병운 (한양대학교 기계설계.메카트로닉스공학과 대학원) ;
  • 박성준 (충주대학교 기계공학과)
  • 발행 : 2009.02.15
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초록

In order to optimize the polishing process, Run to Run control scheme has been applied to the micro mold polishing in this study. Also, to fully understand the effect of parameters on the surface roughness a design of experiment is performed. By linear approximation of main factors such as gap and rotational speed of micro quill, EWMA (Exponential Weighted Moving Average) gradual mode controller is adopted as a optimizing tool. Consequently, the process converged quickly at a target value of surface roughness Ra 10nm and Rmax 50nm, and was hardly affected by unwanted process noises like initial surface quality and wear of magnetic abrasives.

키워드

참고문헌

  1. Choi, J. Y., Kim, H. H., Park, J. H., Jeong, H. D., and Seo, H. D., 2002, "A Study on Nano-polishing of Injection Molds using Fixed Abrasive Pad," Journal of the KSPE, Vol. 19, No. 10, pp. 212-220.
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