Korean Journal of Metals and Materials (대한금속재료학회지)

The Korean Institute of Metals and Materials (대한금속재료학회)
권호 표지

A Study on Manufacturing of LCD Prism Sheets Through Silicon Anisotropic Etching

실리콘 이방성 식각을 통한 LCD 프리즘 시트 제작 연구

  • Jeon, Kwangseok (Department of Display Materials Engineering, SoonChunHyang University) ;
  • Ryoo, Kunkul (Department of Display Materials Engineering, SoonChunHyang University)
  • 전광석 (순천향대학교 신소재공학과) ;
  • 류근걸 (순천향대학교 신소재공학과)
  • Received : 2008.01.30
  • Published : 2008.06.22
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Abstract

Prism sheet of LCD BLU which depends on supply from Japan and U.S.A was studied by using Si anisotropic etching and injection molding technologies. First, the prism sheet was patterned on Si wafer through photolithography, and the best conditions of Si etching were determined through etching Si wafer with TMAH to obtain straight optimized zigzag patterns, and a cross pattern to provide light diffusion and concurrent focusing. The etch rate of TMAH was concluded to be constant for $25wt%-70^{\circ}C$ condition. Ni stamp of prism sheet was made by electrodeposition using patterned Si wafer, normal or fast H/C(Heating/Cooling) injections were carried out to fabricate prism sheet. It was known that fast H/C injection could fabricate prism sheet more accurately than normal injection. Zigzag patterns and the cross pattern showed higher transmissivity than the straight patterns because of light diffusion through diagonal direction. The fast H/C injection for zigzag patterns showed lower transmissivity than normal injection because there occurred more light diffusion through precise injection patterns, but the fast H/C injection for straight patterns showed only refraction without diffusion, causing lower transmissivity than normal injection.

Keywords

Acknowledgement

Supported by : 지식경제부

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