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AAO 나노기공을 나노 임프린트 리소그래피의 형틀로 이용한 PMMA 나노패턴 형성 기술

Fabrication of Nanometer-sized Pattern on PMMA Plate Using AAO Membrane As a Template for Nano Imprint Lithography

  • 이병욱 (순천향대학교 전자정보공학과) ;
  • 홍진수 (순천향대학교 전자물리학과) ;
  • 김창교 (순천향대학교 전자정보공학과)
  • 발행 : 2008.05.01

초록

PMMA light guiding plate with nano-sized pattern was fabricated using anodized aluminum oxide membrane as a template for nano imprint lithography. Nano-sized pore arrays were prepared by the self-organization processes of the anodic oxidation using the aluminum plate with 99.999% purity. Since the aluminum plate has a rough surface, the aluminum plate with thickness of 1mm was anodized after the pre-treatments of chemical polishing, and electrochemical polishing. The surface morphology of the alumina obtained by the first anodization process was controlled by the concentration of electrochemical solution during the first anodization. The surface morphology of the alumina was also changed according to temperature of the solution during chemical polishing performed after first anodization. The pore widening process was employed for obtaining the one-channel with flat surface and height of the channel because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. It is shown from SPM results that the nano-sized pattern on PMMA light guiding plate fabricated by nano imprint lithography method was well transferred from that of anodized aluminum oxide template.

키워드

참고문헌

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