Journal of the Korean Vacuum Society (한국진공학회지)

The Korean Vacuum Society (한국진공학회)
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A Study on the MgO Protective Layer Deposited by Oxygen-Neutral-Beam-Assisted Deposition in AC PDP

산소 중성빔으로 보조증착된 MgO 보호막을 갖는 AC PDP의 특성에 관한 연구

  • Li, Zhao-Hui (Department of Electronics Engineering, Kyungwon University) ;
  • Kwon, Sang-Jik (Department of Electronics Engineering, Kyungwon University)
  • Published : 2008.03.30
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Abstract

The magnesium oxide (MgO) protective layer plays an important role in plasma display panels (PDPs). Our previous work demonstrated that the properties of MgO thin film could be improved, which were deposited by Ion-Beam-Assisted Deposition (IBAD). However arc discharge always occurs during the IBAD process. To avoid this problem, Oxygen-Neutral-Beam-Assisted Deposition (NBAD) is used to deposit MgO thin films in this paper. The energy of the oxygen neutral beam was used as the parameter to control the deposition. The experimental results showed that the oxygen neutral beam energy was effective in determining in structural and discharge characteristics. The lowest firing inception voltage, the highest brightness and the highest luminous efficiency were obtained when the MgO thin film was deposited with an oxygen neutral beam energy of 300eV. The surface morphology of MgO thin film was also analyzed using AFM (Atomic Force Microscopy) and SEM (Scanning Electron Microscopy).

MgO는 플라즈마 디스플레이 패널 (Plasma Display Panel, PDP)의 보호막으로 널리 쓰이고 있다. 기존의 산소 이온빔 보조 증착(Ion-Beam-Assisted Deposition, IBAD) 방법을 이용하여 MgO 보호막을 형성시킨 경우 이온빔의 충전에 의해 야기되는 아크(Arc) 문제 등이 있었다. 이 문제점을 해결하기 위하여, 산소 중성빔 보조증착(Neutral-Beam-Assisted Deposition, NBAD) 방법을 이용하여 MgO를 증착하였다. 그리고 산소 중성빔의 에너지를 변화시킴에 따라 MgO 보호막의 특성과 PDP 패널 방전 특성에 미치는 영향을 분석하였다. 이에 따른 실험 결과로부터 산소 중성빔 에너지가 300eV일 때, 최소 방전 개시 전압, 최고 발광 휘도 및 최고 발광 효율을 얻을 수 있었다.

Keywords

References

  1. T. S. Tae, H. J. Seo, and S. H. Jang, J. Korean Phys. Soc. 42, S844 (2003)
  2. M. Noh, Y. Yi, and K. Jeong, J. Korean Phys. Soc. 42, 631 (2003)
  3. H. Sun, J. Korean Phys. Soc. 40, L777 (2002)
  4. Y. Ushio, T. Banno, N. Matuda, Y. Saito, B, Baba, and A. Kinbara, Thin Solid Films 167, 299 (1988) https://doi.org/10.1016/0040-6090(88)90507-X
  5. I. Koiwa, T. Kanehara, and J. Mita, J. Electrochem. Soc. 142, 1396 (1995) https://doi.org/10.1149/1.2048588
  6. C. Y. Son, J. H. Cho, and J. W. Park, J. Vac. Sci. Technol. A 17, 2619 (1999) https://doi.org/10.1116/1.581920
  7. K. H. Park and Y. S. Kim, IDW'06 Dig., 351 (2006)
  8. S. J. Kwon and Z. H. Li, Jpn. J. Appl. Phys. 46, 217 (2007) https://doi.org/10.1143/JJAP.46.217
  9. Z. H. Li, E. S. Cho, and S. J. Kwon, J. Korean Phys. Soc. 49, 2332 (2006)
  10. Z. H. Li, K. H. Kim, M. H. Ahn, S. J. Hong, S. K. Im. and S. J. Kwon, J. Korean Vac. Sci. 16, 338 (2007) https://doi.org/10.5757/JKVS.2007.16.5.338
  11. D. H. Lee, J. W. Bae, S. D. Park, and G. Y. Yeom, Thin Solid Films 398-399, 647 (2001) https://doi.org/10.1016/S0040-6090(01)01370-0
  12. M. S. Hur, S. J. Kim, H. S. Lee, J. K. Lee, and G. Y. Yeom, IEEE Trans. Plasma Sci. 30, 110 (2002) https://doi.org/10.1109/TPS.2002.1003948
  13. S. J. Kim, H. J. Lee, G. Y. Yeom, and J. K. Lee, Jpn. J. Appl. Phys. 43, 7261 (2004) https://doi.org/10.1143/JJAP.43.7261
  14. K. S. Min, B. J. Park, G. Y. Yeom, S. J. Kim, and J. K. Lee, J. Korean Vac. Sci. 4, 387 (2006)
  15. D. H. Lee, M. J. Jung, J. W. Bae, S. J. Kim, J. K. Lee, and G. Y. Yeom, J. Vac. Sci. Techol. 7, 23 (2003)

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