참고문헌
-
A. Jain, S. Rogojevic, S. Ponoth, N. Agarwal, I. Matthew, W. N. Gill, P. Persans, M. Tomozawa, J. L. Plawsky, and E. Simonyi, "Porous Silica Materials as
$Low-{\kappa}$ Dielectrics for Electronic and Optical Interconnects," Thin Solid Films, 398 513-22 (2001) https://doi.org/10.1016/S0040-6090(01)01311-6 - K. Maex, M. R. Baklanov, D. Shamiryan, F. Lacopi, S. H. Brongersma, and Z. S. Yanoviskaya, "Low Dielectric Constant Materials for Microelectronics," J. Appl. Phys., 93 8793-841 (2003) https://doi.org/10.1063/1.1567460
- R. Rosenberg, D. C. Edelstein, C. K. Hu, and K. P. Rodbell, "Copper Metallization for High Performance Silicon Technology," Annual Review of Materials Science, 30 229-62 (2000) https://doi.org/10.1146/annurev.matsci.30.1.229
- L. W. Hrubesh, "Aerogel application," J. Non-cryst. Solids, 225 [1-3] 335-42 (1998) https://doi.org/10.1016/S0022-3093(98)00135-5
- S.-B. Jung and H.-H. Park, "Control of Wall Thickness in the Formation of Ordered Mesoporous Silica Films," Thin Solid Films, 494 320-24 (2006) https://doi.org/10.1016/j.tsf.2005.08.160
- D. Grosso, F. Cagnol, G. J. de. A. A. Soler-Illia, E. L. Crepaldi, H. Amenitsch, A. Brunet-Bruneau, A. Bourgeois, and C. Sanchez, "Fundamentals of Mesostructuring Through Evaporation-Induced Self-Assembly," Adv. Funct. Mater., 14 309-22 (2004) https://doi.org/10.1002/adfm.200305036
- S.-B. Jung, T.-J. Ha, and H.-H. Park, "Roughness and Pore Structure Control of Ordered Mesoporous Silica Films for the Enhancement of Electrical Properties," J. Appl. Phys., 101 024109-1-9 (2007) https://doi.org/10.1063/1.2424405
- S.-B. Jung, T.-J. Ha, and H.-H. Park, "Investigation of the Properties of Organically Modified Ordered Mesoporous Silica Films," J. Colloid Interf. Sci., in-press https://doi.org/10.1016/j.jcis.2008.01.003
- A. A. Sonin, J. B. Seon, M. H. Yang, H. J. Shin, and H. D. Jeong, "New Hydrophobic Microporous Dielectric Films Made on the Basis of the CTAB/TSC-2/TEOS Precursor Solution," Mol. Cryst. Liq. Cryst., 451 [1] 99-106 (2006) https://doi.org/10.1080/154214090960108
- S. I. Kuroki and T. Kikkawa, "Measurement and Analysis of Water Adsorption in Porous Silica Films," J. Electrochem. Soc., 153 [8] G759-64 (2006) https://doi.org/10.1149/1.2210573
- T.-J. Ha, S. G. Choi, S.-B. Jung, B.-G. Yu, and H.-H. Park, "The Improvement of Mechanical and Dielectric Properties of Ordered Mesoporous Silica Film using TEOS-MTES Mixed Silica Precursor," Ceram. Int. (2007), doi:10.1016/ j.ceramint.2007.09.070
- J. Farkas, J. Hampden-Smith, and T. T. Kodas, "FTIR Studies of the Adsorption/Desorption Behavior of Cu Chemical Vapor Deposition Precursors on Silica," J. Electrochem. Soc., 141 [12] 3547-55 (1994) https://doi.org/10.1149/1.2059368