분석과학 (Analytical Science and Technology)

  • 제21권5호
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  • Pages.432-437
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  • 2008
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  • 1225-0163(pISSN)
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  • 2288-8985(eISSN)
한국분석과학회 (The Korean Society of Analytical Sciences)
권호 표지
DOI QR코드

DOI QR Code

여러 가지 모노머와 첨가제를 가지고 전기환원법에 의해 제조된 폴리실란의 반응속도

The reaction rate of polysilanes prepared by electroreduction with different monomers and additives

  • 장봉군 (안휘건축대학, 안휘첨단건축재료연구실) ;
  • 진명량 (한서대학교, 신소재공학과) ;
  • 오원춘 (한서대학교, 신소재공학과)
  • Zhang, Feng-Jun (Anhui Key Laboratory of Advanced Building Materials, Anhui University of Architecture) ;
  • Chen, Ming-Liang (Department of Advanced Materials & Science Engineering, Hanseo University) ;
  • Oh, Won-Chun (Department of Advanced Materials & Science Engineering, Hanseo University)
  • 투고 : 2008.05.06
  • 심사 : 2008.09.18
  • 발행 : 2008.10.25
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초록

본 연구에서 초음파 조사하에서 Mg 전극을 사용하여 $CH_3HSiCl_2$, $PhSiCl_3$, $CH_3SiCl_3$ 및 $(CH_3)_2SiCl_2$와 같은 여러 가지 모노머를 가지고 전기환원법에 의하여 폴리실란을 합성하였다. 또한 반응속도에 있어서 모노머와 첨가제 (p-dibromobenzene (DBB), naphthalene (NAPH) 및 anthracene (ANTH))의 효과를 연구하였다. 네 종류의 모노머중에서 $PhSiCl_3$의 고분자화 반응은 아주 높은 반응속도를 보였다. 또한, p-dibromobenzene(DBB)는 가장 좋은 첨가제로 입증되었다. 이들 관찰에 근거하여 이들의 고분자화 반응에서 가능한 반응 메커니즘을 제시하였다.

In this study, polysilanes were synthesized by electroreduction with different monomers such as $CH_3HSiCl_2$, $PhSiCl_3$, $CH_3SiCl_3$ and $(CH_3)_2SiCl_2$ by Mg electrodes under ultrasonic radiation. The effects of monomers and additives (p-dibromobenzene (DBB), naphthalene (NAPH) and anthracene (ANTH)) on the reaction rate were investigated. Polymerization of $PhSiCl_3$ among the four monomers showed the highest rate. p-dibromobenzene (DBB) was proved the most effective additive. Based on the observations, some possible reaction mechanisms of the polymerization were proposed.

키워드

참고문헌

  1. A. Yamaguchi, T. Ogawa and H. Tachibana, J. Electrochem. Soc, 143, 657-664(1996) https://doi.org/10.1149/1.1836496
  2. R. D. Miller, D. Hofer, D. Rabolt and G. Fickes, J. Am. Chem. Soc, 107, 2171-2172(1985) https://doi.org/10.1021/ja00293a057
  3. H. Kuzmany, J. F. Rabolt, B. L. Farmer and R. D. Miller, Chem. Phys, 85, 7417-7420(1986)
  4. F. C. Schilling, A. J. Lovinger and J. M. Ziegler, Macromolecules, 22, 3061-3068(1989)
  5. H. Suzuki, Adv. Mater, 8, 657-661(1986) https://doi.org/10.1002/adma.19960080812
  6. H. Suzuki, J. Lumin, 1005, 72-74(1997)
  7. H. Suzuki, J. Meyer and J. Slimmerer, Adv. Mater, 5, 743-748(1996) https://doi.org/10.1002/adma.19930051013
  8. A. Fujiki, K. Yoshimoto and Y. Ohmori, Jpn. J. Appl. Phys, 34, 1365-1367(1995) https://doi.org/10.1143/JJAP.34.L1365
  9. R. D. Miller, D. Hofer and G. N. Fickes, Polym. Eng. Sci, 26, 1129-1136(1986) https://doi.org/10.1002/pen.760261610
  10. K. Kanemitsu, K. Suzuki and T. Masumoto, Solid State Commun, 86, 545-548(1993) https://doi.org/10.1016/0038-1098(93)90136-B
  11. S. Yajima, J. Hayashi and M. Omori, Chem. Lett, 75, 931-934(1975)
  12. Y. Hasegawa and K. J. OKamura, Mater. Sci, 20, 321-326(1985) https://doi.org/10.1007/BF01199357
  13. X. Bao, M. J. Edirisinghe and G. F. Fernado, J. Euro. Ceram. Soc, 18, 915-922(1998) https://doi.org/10.1016/S0955-2219(97)00194-5
  14. R. D. Miller, D. Thompson and R. Sooriyakumaran, J. Polym. Sci. A, 29, 813-824(1991) https://doi.org/10.1002/pola.1991.080290604
  15. D. Bratton, J. Holder and J. Simon, J. Organomet. Chem, 685, 60-64(2003) https://doi.org/10.1016/S0022-328X(03)00641-7
  16. K. Shigenori, I. Manabu and B. B. Hang, Tetrahedron Lett, 38, 4607-4610(1997) https://doi.org/10.1016/S0040-4039(97)00987-8
  17. A. V. Lori, S. Kevin and J. B. Wang, Electrochimica Acta, 45, 1007-1014(1999) https://doi.org/10.1016/S0013-4686(99)00303-5
  18. A. V. Lori and K. Hang, Polymer, 41, 441-444(2000) https://doi.org/10.1016/S0032-3861(99)00190-1
  19. O. Mitsutoshi, T. Takeshi and H. Hiroshi, Electrochimica Acta, 44, 3475-3482(1999) https://doi.org/10.1016/S0013-4686(99)00104-8
  20. U. Manobu, T. Michio and I. Hiroshi, Electrochimica Acta, 35, 1867-1872(1990) https://doi.org/10.1016/0013-4686(90)87092-G
  21. K. Atsutaka, T. Eiji and K. Toshihiro, Organometallics, 11, 2899-2903(1992) https://doi.org/10.1021/om00044a033
  22. L. Zhiyin, Organosilicon compounds industry analysis. Beijing. Chemical Industry Press, 63-64(1979)
  23. A. Watanabe, Y. Miike and M. Tsutsumi, Macromolecule, 26, 2111-2116(1993) https://doi.org/10.1021/ma00060a046
  24. F. J. zhang and L. Chen, J. Shanghai Uni., 12, 543-546(2006)
  25. S. Wu, L. Chen and F. J. zhang, Polym. Mater. Sci. & Eng., 23, 64-67(2007)
  26. R. D. Miller and J. Michl, Chem. Rev, 89, 1359-1410(1989) https://doi.org/10.1021/cr00096a006
  27. M. Okano, K. Takeda and T. Toriumi, Electrochim. Acta, 44, 659-666(1998) https://doi.org/10.1016/S0013-4686(98)00173-X
  28. S. M. Xing and Y. L. Wang, Organosilicon Synthetic Technics and Application of the Production. Beijing. Chemical Industry Press. 126-127(2000)
  29. J. F. Fu, S. F. Li and J. M. Liu., J. Insulating Material. 22, 92-94(2005)
  30. P. Zuren, Polymer Chemistry. Beijing, Chemical Industry Press. 132-133(2003)