Macromolecular Research

The Polymer Society of Korea (한국고분자학회)
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Thermally Stable Photoreactive Polymers as a Color Filter Resist Bearing Acrylate and Cinnamate Double Bonds

  • Cho, Seung-Hyun (Polymer Technology Institute, Sungkyunkwan University) ;
  • Lim, Hyun-Soon (Department of Chemical Engineering, Sungkyunkwan University) ;
  • Jeon, Byung-Kuk (Department of Chemical Engineering, Sungkyunkwan University) ;
  • Ko, Jung-Min (Department of Chemical Engineering, Sungkyunkwan University) ;
  • Lee, Jun-Young (Department of Chemical Engineering, Sungkyunkwan University) ;
  • Ki, Whan-Gun (Department of Applied Chemistry, Seokyeong University)
  • Published : 2008.01.31
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Abstract

Photoreactive polymers as a color filter resist containing both photoreactive acrylate and cinnamate double bonds were synthesized usin two step reactions. The chemical structures of the synthesized polymers were confirmed by $^1H$-NMR and FT-IR spectroscopy. The photoreactive polymers were quite soluble in most common organic solvents and produced excellent quality thin films by spin-coating. The photocuring kinetics of the acrylate and cinnamate double bonds were examined by FT-IR and UV- Vis spectroscopy, which confirmed the excellent photoreactivity of both the acrylate and cinnamate double bonds in the polymers. Upon UV irradiation, photocuring was almost completed within approximately 5 min, irrespective of the type of the prepolymers. The polymers also exhibited superior thermal stability, showing little change in transmittance in the visible region even after heating to $250^{\circ}C$ for one hour. Photolithographic micropatterns could be obtained with a resolution of a few microns.

Keywords

References

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