Control of axial segregation by the modification of crucible geometry

  • Lee, Kyoung-Hee (Department of Applied Chemistry, Dongyang Technical College)
  • Published : 2008.10.31

Abstract

We will focus on the horizontal Bridgman growth system to analyze the transport phenomena numerically, because the simple furnace system and the confined growth environment allow for the precise understanding of the transport phenomena in solidification process. In conventional melt growth process, the dopant concentration tends to vary significantly along the crystal. In this work, we propose the modification of crucible geometry for improving the productivity of silicon single-crystal growth by controlling axial specific resistivity distribution. Numerical analysis has been performed to study the transport phenomena of dopant impurities in conventional and proposed Bridgman silicon growth using the finite element method and implicit Euler time integration. It has been demonstrated using mathematical models and by numerical analysis that proposed method is useful for obtaining crystals with superior uniformity along the growth direction at a lower cost than can be obtained by the conventional melt growth process.

Keywords

References

  1. F. Shimura, in: Semiconductor Silicon Crystal Technology (Academic Press, London, 1989) p. 96
  2. J.H. Wang, D.H. Kim and H.-D. Yoo, "Two-dimensional analysis of axial segregation in batchwise and continuous Czochralski process", J. Crystal Growth 198/ 199 (1999) 120 https://doi.org/10.1016/S0022-0248(98)01078-1
  3. N. Ono, M. Kida, Y. Abe and K. Sahira, "A new technique for controlling the dopant concentration in the double-crucible method", J. Crystal Growth 135 (1994) 359 https://doi.org/10.1016/0022-0248(94)90763-3
  4. A. Anselmo, V. Prasad, J. Koziol and K.P. Gupta, "Numerical and experimental study of a solid pellet feed continuous Czochralski growth process for silicon single crystals", J. Crystal Growth 131 (1993) 247 https://doi.org/10.1016/0022-0248(93)90420-2
  5. M.H. Lin and S. Kou, "Further report on dopant segregation control in Czochralski crystal growth with a wetted float", J. Crystal Growth 135 (1994) 643 https://doi.org/10.1016/0022-0248(94)90161-9
  6. A. Anselmo, J. Koziol and V. Prasad, "Full-scale experiments on solid-pellets feed continuous Czochralski growth of silicon crystals", J. Crystal Growth 163 (1996) 359 https://doi.org/10.1016/0022-0248(95)00986-8
  7. Y. Shiraishi, S. Kurosaka and M. Imai, "Silicon crystal growth using a liquid-feeding Czochralski method", J. Crystal Growth 166 (1996) 685 https://doi.org/10.1016/0022-0248(95)00558-7
  8. S.J. Baek, J.S. Chang, E.S. Choi and H.H. Lee, "Axial dopant distribution and its control in bulk crystal growth", J. Crystal Growth 131 (1993) 481 https://doi.org/10.1016/0022-0248(93)90200-G
  9. J.H. Wang, D.H. Kim and J.-S. Huh, "Modelling of crystal growth process in heat exchanger method", J. Crystal Growth 174 (1997) 13 https://doi.org/10.1016/S0022-0248(96)01055-X
  10. P. Hood, "Frontal solution program for unsymmetric matrices", Int. J. Numer. Meth. Eng. 10 (1976) 379 https://doi.org/10.1002/nme.1620100209
  11. D.R. Lynch and W.G. Gray, "Finite element simulation of flow in deforming regions", J. Comput. Phys. 36 (1980) 135 https://doi.org/10.1016/0021-9991(80)90180-1