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Al2O3 Coating on Transparent Polycarbonate Substrates for the Hard-coating Application

투명 폴리카보네이트 보호코팅을 위한 산화알루미늄 박막

  • Kim, Hun (Plasma Surface Engineering Laboratory, School of Materials Science and Engineering, Seoul National University) ;
  • Nam, Kyoung-Hee (Plasma Surface Engineering Laboratory, School of Materials Science and Engineering, Seoul National University) ;
  • Jang, Dong-Su (Plasma Surface Engineering Laboratory, School of Materials Science and Engineering, Seoul National University) ;
  • Lee, Jung-Joong (Plasma Surface Engineering Laboratory, School of Materials Science and Engineering, Seoul National University)
  • 김훈 (서울대학교 재료공학부) ;
  • 남경희 (서울대학교 재료공학부) ;
  • 장동수 (서울대학교 재료공학부) ;
  • 이정중 (서울대학교 재료공학부)
  • Published : 2007.08.31

Abstract

Transparent aluminum oxide films were deposited on polycarbonate (PC) substrates by inductively coupled plasma (ICP) assisted reactive sputtering. the oxygen flow rate was regulated by controlling the target voltage with a proportional integrate derivative controller. The PC substrate was treated with plasma prior to the deposition in order to the enhance the adhesive strength of the $Al_2O_3$ film. The characteristics of hardness, structure, density, transmittance, deposition rate, surface roughness and residual stress were investigated to estimate the possibility for the hard coating.

Keywords

References

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