마이크로전자및패키징학회지 (Journal of the Microelectronics and Packaging Society)
- 제14권2호
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- Pages.9-15
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- 2007
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- 1226-9360(pISSN)
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- 2287-7525(eISSN)
전기도금 공정으로 제조한 Bi-Te 박막의 열전특성 및 미세열전소자 형성용 포토레지스트 공정
Thermoelectric Characteristics of the Electroplated Bi-Te Films and Photoresist Process for Fabrication of Micro Thermoelectric Devices
- Lee, Kwang-Yong (Department of Materials Science and Engineering, Hongik University) ;
- Oh, Tae-Sung (Department of Materials Science and Engineering, Hongik University)
- 발행 : 2007.06.30
초록
미세열전박막소자에 적용을 하기 위해 전기도금으로 형성한 Bi-Te 박막의 열전특성과 포토레지스트 공정에 대하여 연구하였다.
Thermoelectric properties of the electrodeposited Bi-Te films and photoresist process have been investigated to apply for thermoelectric thin film devices. After plating in Bi-Te solutions of 20 mM concentration, which were prepared by dissolving