한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제40권3호
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  • Pages.113-116
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  • 2007
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  • 1225-8024(pISSN)
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  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
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반응성 RF 마그네트론 스퍼터링법을 이용하여 MgO 기판위에 증착한 TiO2 박막의 구조와 광촉매 특성

Structure and Photo-catalytic Activity of TiO2 Films Deposited by Reactive RF Magnetron Sputtering

  • Lee, Jung-Chul (School of Materials Science and Engineering, Pusan National University) ;
  • Song, Pung-Keun (School of Materials Science and Engineering, Pusan National University)
  • 발행 : 2007.06.30
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초록

Titanium dioxide ($TiO_2$) films were deposited by RF reactive magnetron sputtering on non-alkali glass and single crystal MgO (100) substrate at substrate temperature of $400^{\circ}C$. Micro structures of $TiO_2$ films were investigated by XRD, FE-SEM, and Pole figure measurements. $TiO_2$ films deposited on glass substrate showed preferred orientation of anatase (101), whereas $TiO_2$ films deposited on the MgO single crystal substrate showed hetero-epitaxial anatase (100). $TiO_2$ film grown on MgO substrate showed higher photoctalytic activity than that of glass substrate.

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참고문헌

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