DOI QR코드

DOI QR Code

Properties of AZO Thin Film deposited on the PES Substrate

PES 기판상에 증착된 AZO 박막의 특성

  • 김상모 (경원대학교 전기공학과) ;
  • 김경환 (경원대학교 전기공학과)
  • Published : 2007.12.01

Abstract

We prepared the Al doped ZnO (AZO) thin film on polyethersulfon (PES) without any substrate heating by Facing Targets Sputtering (FTS) system. FTS system has two different facing targets. One is ZnO doped the content of Al 2 wt% and the other is Zn in order to decrease resistivity. The electrical, structural and optical properties of AZO thin films were investigated. To evaluate the as-deposited thin film properties, we employed four-point probe (CMT-R100nw, Changmin), Surface profiler (Alpha-step, Tencor), UV/VIS spectrometer (HP), X-ray diffractometer (XRD, Rigaku) and Field Emission Scanning Electron Microscopy (FESEM, Hitachi S-4700). As a result, We obtained that AZO thin film deposited on PES substrate at a DC Power of 150 W, working pressure of 1 mTorr and $O_2$ gas flow ratio of 0.2 exhibited the resistivity of $4.2{\times}10^{-4}\;[{\Omega}cm]$ and the optical transmittance of about 85 % in the visible range.

Keywords

References

  1. Y. Igasaki and H. Saito, 'The effects of zinc diffusion on the electrical and optical properties of ZnO:AI films prepared by r.f. reactive sputtering', Journal of Applied Physics, Vol. 199, No.2, p. 223, 1991
  2. 조범진, 김경환, 'PC 기판상에 제작된 ITO 박막의 특성', 전기전자재료학회논문지, 20권, 2호, p. 162, 2007 https://doi.org/10.4313/JKEM.2007.20.2.162
  3. 김건희, 금민종, 김한기, 손인환, 장경욱, 이원재, 박용서, 최형욱, 김경환, 'FTS법을 이용한 ITO박막의 제작', 전기전자재료학회논문지, 17권, 11호, p. 1230, 2004
  4. 금민종, 김경환, '스퍼터링법을 이용한 OLED용 Al 음전극 제작', 전기전자재료학회논문지, 18권, 8호, p. 729, 2005
  5. J. S. Yang, H. Y. Seong, M. J. Keum, J. H. Son, and K. H. Kim, 'Preparation of transparent conductive thin films by facing targets sputtering system', Surface and Coatings Technology, Vol. 169-170, p. 575, 2003
  6. K. H. Kim, 'The preparation of indium tin oxide films as a function of oxygen gas flow rate by a facing target sputtering system', Joural of Ceramic Processing Research, Vol. 8, No.1, p. 19, 2007
  7. M. J. Keum, B. J. Cho, H W. Choi, S. J. Park, and K. H. Kim, 'Preparation of Al doped ZnO thin films as a function of substrate temperature by a facing target sputtering system', Joural of Ceramic Processing Research, Vol. 8, No.1, p. 56, 2007
  8. K. H. Kim, I. H. Son, K. B. Song, S. H. Kong, M. J. Keum, S. Nakagawa, and M. Naoe, 'Thin film properties by facing targets sputtering system', Applied Surface Science, Vol. 169-170, p. 410, 2001
  9. A. Y. Igasaki and H. Kanma, 'Argon gas pressure dependence of the properties of transparent conducting ZnO:Al films deposited on glass substrates', Applied Surface Science, Vol. 169-170, p. 508, 2001
  10. A. P. Roth, J. B. Webb, and D. F. Williams, 'Absorption edge shift in ZnO thin films at high carrier densities', Solid State Communications, Vol. 39, p. 1269, 1981 https://doi.org/10.1016/0038-1098(81)90224-6