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The characteristics of Pt thin films prepared by DC magnetron sputter

DC Magnetron Sputter로 제조된 Pt 박막의 특성

  • Na, Dong-Myong (Department of Materials science and Engineering, Chosun University) ;
  • Kim, Young-Bok (Department of Materials science and Engineering, Chosun University) ;
  • Park, Jin-Seong (Department of Materials science and Engineering, Chosun University)
  • 나동명 (조선대학교 첨단소재공학과) ;
  • 김영복 (조선대학교 첨단소재공학과) ;
  • 박진성 (조선대학교 첨단소재공학과)
  • Published : 2007.03.31

Abstract

Thin films of platinum were deposited on a $Al_{2}O_{3}/ONO(SiO_{2}-Si_{3}N_{4}-SiO_{2})/Si$-substrate with an 2-inch Pt(99.99 %) target at room temperature for 20, 30 and 60 min by DC magnetron sputtering, respectively X-ray diffract meter (XRD) was used to analyze the crystallanity of the thin films and field emission scanning electron microscopy (FE-SEM) was employed for the investigation on crystal growth. The densification and the grain growth of the sputtered films have a considerable effect on sputtering time and annealing temperatures. The resistance of the Pt thin films was decreased with increasing deposition time and sintering temperature. Pt micro heater thin film deposited for 60 min by DC magnetron sputtering on an $Al_{2}O_{3}$/ONO-Si substrate and annealed at $600^{\circ}C$ for 1 h in air is found to be a most suitable micro heater with a generation capacity of $350^{\circ}C$ temperature and 645 mW power at 5.0 V input voltage. Adherence of Pt thin film and $Al_{2}O_{3}$ substrate was also found excellent. This characteristic is in good agreement with the uniform densification and good crystallanity of the Pt film. Efforts are on progress to find the parameters further reduce the power consumption and the results will be presented as soon as possible.

Keywords

References

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