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Fabrication and characteristics of ITO thin films on CR39 substrate for transparent OTFT

  • Kwon, Sung-Yeol (Divison of Electrical Control & Instrumentation Engineering Pukyong National University)
  • Published : 2007.05.31

Abstract

The indium tin oxide (ITO) films were deposited on CR39 substrate using DC magnetron sputtering. The ITO thin films deposited at room temperature because CR39 substrate its glass-transition temperature is $130^{\circ}C$. The ITO thin films used bottom and top electrode and for organic thin film transparent transistors (OTFTs). The ITO thin film electrodes electrical properties and optical transparency properties in the visible wavelength range (300-800 nm) strongly dependent on volume of oxygen percent. For the optimum resistivity and transparency of the ITO thin film electrode achieved with a 75 W plasma power, 10 % volume of oxygen and a 27 nm/min deposition rate. Above 85 % transparency in the visible wavelength range (300-800 nm) measured without post annealing process and a low resistivity value $9.83{\times}10^{-4}{\Omega}cm$ was measured thickness of 300 nm. All fabrication process of ITO thin films did not exceed $80^{\circ}C$.

Keywords

References

  1. X. Zheng, Y. Wu, R. Sun, W. Zhu, X. Jiang, Z. Zhang, and S. Xu, 'Efficiency improvement of organic lightemitting diodes using 8-hydroxy-quinolinato lithium as an electron injection layer', Thin Solid Films, vol. 478, pp. 252-255, 2005 https://doi.org/10.1016/j.tsf.2004.08.020
  2. M. Kim, L. Park, and S. Park, 'Electro-optical properties of organic thin film EL device using PPV', J Kor. Sensors Soc. vol. 7, no. 2, pp. 97-102, 1998
  3. D. Kim, Y. Lee, J. Park, J. Choi, and D. Kang, 'Fabrication and electrical characterization of pentacene-based diodes', J Kor. Vacuum Soc, vol. 9, no. 4, pp. 379-381, 2000
  4. D. U. Kim, 'Comparison of organic EL characteristics of low mass dye and polymer material with the same chromophore', J Kor. Sensors Soc. vol. 8, no. 2, pp. 177-181, 1999
  5. B. W. Lee, 'Preparation and characterization of transparent conductive ITO films by MOD process', J of Kor. Ceramic Soc, vol. 35, no. 4, pp. 385-391, 1998
  6. S. B. Qadri, H. Kim, H. R. Khan, A. Pique, J. S. Horwitz, D. Chrisey, and E. F. Skelton, 'Optical and electrical properties of transparent conducting $In_2$$O_3$-$ZrO_2^{st}$ Films', J. of Materials Research, vol. 15, no. 1, pp. 21-24, 2000 https://doi.org/10.1557/JMR.2000.0007
  7. M. Rottmann, H. Hennig, B, Ziemer, R. Kalahne, and K. H. Heckner, 'Variations in microstructure and composition of indium tin oxide-films with the deposition technique', J of Materials Science, vol. 31. no. 4, pp. 6495-6500, 1996 https://doi.org/10.1007/BF00356253
  8. S. Y. Kwon, 'Surface morphology and electrical properties of ITO thin films fabricated by RF magnetron sputtering method', J. Kor. Sensors Soc. vol. 15, no. 1, pp. 71-75, 2006 https://doi.org/10.5369/JSST.2006.15.1.071
  9. H. J. Ha, J. S. Cho, and C. H. Park, 'The study on formation of ITO by DC reactive magnetron sputtering', J of the Kor. Ceramic Soc, vol. 37, no. 7, pp. 686-692, 2000
  10. T. Ornata, M. Kita, H. Okada, S. Otsuka-Yao-Matsuo, Naoki Ono, and H. Ikawa, 'Characterization of indium-tin oxide sputtering targets showing various densities of nodule formation', Thin Solid Films, vol. 503, pp. 22-28, 2006 https://doi.org/10.1016/j.tsf.2005.09.200
  11. H. R. Fallash, M. Ghasemi, A. Hassanzadeh, and H. Steki, 'The effect of deposition rate on electrical, optical and structural properties of tin-doped indium oxide (ITO) films on glass at low substrate temperature', Physica B: Condensed Matter, vol. 373, no. 15, pp. 274-279, 2006 https://doi.org/10.1016/j.physb.2005.11.159
  12. S. H. Shin, H. H. Kim, and K. J. Park, 'A study on material properties and fabrication of ITO thin films by unbalanced-magnet structure in magnetron sputtering', J of the Kor. Ins. of Electrical Material Eng., vol. 10, no. 7, pp. 700-705, 1997