Transactions on Electrical and Electronic Materials

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Holographic Grating Erasing Characteristics by Non-polarized Beam in Amorphous Chalcogenide Thin Films

  • Lee, Ki-Nam (Department of Electronic Materials Engineering, 3DRC, Kwangwoon University) ;
  • Park, Jeong-Il (Department of Electronic Materials Engineering, 3DRC, Kwangwoon University) ;
  • Chung, Hong-Bay (Department of Electronic Materials Engineering, 3DRC, Kwangwoon University)
  • Published : 2006.06.01
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Abstract

In the present work, we investigated the holographic grating erasing method by means of the optical method. It was formed the grating under the interference of holographic recording He-Ne laser beams on chalcogenide $As_{40}Ge_{10}Se_{15}S_{35}$ thin film with various film thickness and erased the holographic grating by non-polarized He-Ne laser beam. As the results, the recording grating erased the 80 % of formed grating by non-polarized He-Ne laser beam. It was confirmed that the erasing characteristics by non-polarized laser beam need to improve the focusing of beam and the control of beam intensity. And then it can be expected as the application possibility of rewritable holographic memory technology.

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References

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