Abstract
In this study, we analyzed the effects of several process variables on the removal efficiencies of NO and $SO_2$ by the dielectric barrier discharge process combined with photocatalysts. The $TiO_2$ photocatalysts were coated onto the spherical-shaped glass beads as dielectric materials by the dip-coating method to analyze the effects of photodegradation reaction on the NO and $SO_2$ removal. As the voltage applied to the plasma reactor increases, or as the pulse frequency of applied voltage increases, the NO and $SO_2$ removal efficiencies increase. Also as the residence time increases, or as the initial concentration of NO decreases, the NO and $SO_2$ removal efficiencies increase. The higher the amount of $TiO_2$ particles coated onto the glass bead is, the larger the surface area of $TiO_2$ particles for the photodegradation reaction is and the NO and $SO_2$ are removed more quickly by the faster photodegradation reactions.
