Journal of Electrical Engineering and Technology

The Korean Institute of Electrical Engineers (대한전기학회)
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Effect of Deposition Rate on the Property of ZnO Thin Films Deposited by Pulsed Laser Deposition

  • Kim Jae-Won (Dept. of Electrical and Electronic Engineering, Yonsei University) ;
  • Kang Hong-Seong (Dept. of Electrical and Electronic Engineering, Yonsei University) ;
  • Lee Sang-Yeol (Dept. of Electrical and Electronic Engineering, Yonsei University)
  • Published : 2006.03.01
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Abstract

ZnO thin films were deposited at different repetition rates of 5 Hz and 10 Hz by pulsed laser deposition. X-ray diffraction (XRD) full widths at half maximum (FWHMs) of (002) ZnO peak in ZnO thin film deposited at 5 Hz and 10 Hz was 0.22 and $0.26^{\circ}$, respectively. The grain size of ZnO thin film deposited at 5 Hz was larger than that of 10 Hz. The variation of repetition rates did not have an effect on the optical property of ZnO thin films. The degradation of the crystalline quality and surface morphology in ZnO thin film deposited at 10 Hz resulted from supersaturation effect by decrease of time interval between a ZnO particle arriving on a substrate by laser shot and a ZnO particle arriving on a substrate by next laser shot.

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