Thin Film Micromachining Using Femtosecond Laser Photo Patterning of Organic Self-assembled Monolayers

  • Chang Won-Seok (Nano Machining Team, Korea Institute of Machinery & Materials) ;
  • Choi Moo-Jin (Facilities Management Team, Busan Port Authority) ;
  • Kim Jae-Gu (Nano Machining Team, Korea Institute of Machinery & Materials) ;
  • Cho Sung-Hak (Nano Machining Team, Korea Institute of Machinery & Materials) ;
  • Whang Kyung-Hyun (Nano Machining Team, Korea Institute of Machinery & Materials)
  • 발행 : 2006.01.01

초록

Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

키워드

참고문헌

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