미세가공기술을 이용한 초소형 광픽업용 대면적 실리콘 미러 제작

fabrication of the Large Area Silicon Mirror for Slim Optical Pickup Using Micromachining Technology

  • 박성준 (삼성전기 중앙연구소 eMD Lab.) ;
  • 이성준 (삼성전기 중앙연구소 eMD Lab.) ;
  • 최석문 (삼성전기 중앙연구소 eMD Lab.) ;
  • 이상조 (연세대학교 기계공학부)
  • 발행 : 2006.01.01

초록

In this study, fabrication of the large area silicon mirror is accomplished by anisotropic wet etching using micromachining technology for implementation of integrated slim optical pickup and the process condition is also established for improving the mirror surface roughness. Until now, few results have been reported about the production of highly stepped $9.74^{\circ}$ off-axis-cut silicon wafers using wet etching. In addition rough surface of the mirror is achieved in case of tong etching time. Hence a novel method called magnetorheolocal finishing is applied to enhance the surface quality of the mirror plane. Finally, areal peak to valley surface roughness of mirror plane is reduced about 100nm in large area of $mm^2$ and it is applicable to optical pickup using infrared wavelength.

키워드

참고문헌

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