Transactions on Electrical and Electronic Materials

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Alignment Effect of a Nematic Liquid Crystal on Deposited SiOx Thin-Film Surface with e-beam Evaporation

  • Oh, Yong-Cheul (Department of Electrical Engineering, Kwangwoon University) ;
  • Lee, Dong-Gyu (Department of Electrical Engineering, Kwangwoon University)
  • Published : 2006.12.30
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Abstract

We have studied liquid crystal (LC) aligning capabilities for homeotropic alignment and the control of tilt angles on the $SiO_{x}$ thin film by electron beam evaporation method. A high tilt angle of about $86.5^{\circ}$ was obtained, and also the suitable tilt angle of the NLC on the $SiO_{x}$ thin film at $20{\sim}50\;nm$ thickness with e-beam evaporation can be achieved. The uniform LC alignment on the $SiO_{x}$ thin film surfaces with electron beam evaporation can be achieved. It is considerated that the LC alignment on the $SiO_{x}$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $SiO_{x}$ thin film surface created by evaporation.

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References

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