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티타늄 기지을 이용한 구리 전해도금 시 Arabic Gum 첨가제의 영향

The Effect of Arabic Gum on the Copper Electrodeposition using Titanium Substrate

  • 우태규 (전북대학교 공과대학 신소재공학부 및 공업기술연구센터) ;
  • 박일송 (전북대학교 공과대학 신소재공학부 및 공업기술연구센터) ;
  • 이현우 (전북대학교 공과대학 신소재공학부 및 공업기술연구센터) ;
  • 설경원 (전북대학교 공과대학 신소재공학부 및 공업기술연구센터)
  • Woo, Tae-Gyu (Division of Advanced Materials Engineering and Research Center of Industrial Technology, Chonbuk National University) ;
  • Park, Il-Song (Division of Advanced Materials Engineering and Research Center of Industrial Technology, Chonbuk National University) ;
  • Lee, Hyun-Woo (Division of Advanced Materials Engineering and Research Center of Industrial Technology, Chonbuk National University) ;
  • Seol, Kyeong-Won (Division of Advanced Materials Engineering and Research Center of Industrial Technology, Chonbuk National University)
  • 발행 : 2006.12.27

초록

The purpose of this study is to identify the effect of additives during copper electrodeposition. Additives such as arabic gum, chloride ions and glue were used in this study. Electrochemical experiments allied to SEM and roughness examination were performed to characterize of the copper foil in the presence of additives. In the production of electrodeposited copper foil, the surface roughness and grain size of the copper foil can be controlled by addition additives. on this study, the more uniform and hemispherical copper crystals are during the initial stages, the smaller crystal size and surface roughness of copper foil are. The surface roughness of copper foil electrodeposited at the current density of 500 $mA/cm^2$ under galvanostatic mode for 60 seconds has a minimum value of 0.136 ${\mu}$m when adding 2 ppm of arabic gum.

키워드

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