한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제39권4호
  • /
  • Pages.153-159
  • /
  • 2006
  • /
  • 1225-8024(pISSN)
  • /
  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지

가스 유량제어에 의한 나노다이아몬드 박막의 특성연구

A Study on the Characteristics of Nanodiamond Films with the Gas Flow Control

  • 김태규 (부산대학교 나노시스템공정공학과) ;
  • 김창훈 (한국부품소재산업진흥원 기술개발본부)
  • Kim, Tae-Gyu (Dept. of Nano System & Process Engineering, Pusan National University) ;
  • Kim, Chang-Hoon (Korea Materials & Components Industry Agency)
  • 발행 : 2006.08.30
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

Nanodiamond films were deposited on Si substrate by introducing a time dependent on/off modulation of $CH_4\;and\;O_2$ flows in a vertical-type microwave plasma enhanced chemical vapor deposition system. Surface morphology and diamond quality of the film were investigated as a function of the on/off modulation time interval. The diamond nucleation density on the substrate was enhanced under low temperature and low pressure condition. In addition, the diamond nucleation density was enhanced by increasing the on/off modulation time interval. Enhanced diamond quality was noticeable under the condition of a longer on/off modulation time interval. It was suggested that the nanodiamond nuclei formed the cluster formation.

키워드

참고문헌

  1. M. Moore, A. R. Lang, J. Crystal Growth, 26 (1974) 133 https://doi.org/10.1016/0022-0248(74)90213-9
  2. R. C. Devries, Ann. Rev. Mat. Sci., 17 (1987) 161 https://doi.org/10.1146/annurev.ms.17.080187.001113
  3. S. Matsumoto, Y. Sato, M. Kamo, N. Setaka, Jap. J. Appl. Phys., 21 (1982) 183 https://doi.org/10.1143/JJAP.21.L183
  4. E. A. Konorova, S. F. Kozlov, Soviet Phy.-Semiconductors, 4(10) (1981) 1600
  5. M. Frenklach, NATO ASI. Series, 266, Plenum, New York, (1991) 499
  6. Y. Hirose, Y. Terasawa, Jap. J. Appl., 25 (1986) 519 https://doi.org/10.1143/JJAP.25.519
  7. T. G. Kim, J. of the Electrochemical Society, 147(10) (2000) 3935 https://doi.org/10.1149/1.1393999
  8. T. G. Kim, S. H. Kim, Thin Solid Films, 425 (2003) 282 https://doi.org/10.1016/S0040-6090(02)01115-X
  9. T. Kawato, K. Kondo, Jap. J. Appl. Phys., 26 (1987) 1429 https://doi.org/10.1143/JJAP.26.1429