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AZO Films Prepared by Facing Target Sputtering System

  • Kim, Kyung-Hwan (Department of Electrical & Information Engineering, Kyungwon University)
  • 발행 : 2006.10.01

초록

Al oped zinc oxide (AZO) films were prepared by Facing Targets Sputtering (FTS) system for TCO applications. The electrical, optical and structural properties of AZO thin films have been investigated with input current, oxygen gas flow ratio and substrate temperature. Deposition was carried out at room temperature and $200^{\circ}C$. Working gas pressures were fixed at 1mTorr. As a result, AZO thin film deposited with an optical transmittance over 80 % and a resistivity about $10^{-4}{Omega}{\cdot}cm$.

키워드

참고문헌

  1. Fujita D. C., Fujita S. Z., and Park S. G., 'Growth of polycrystalline GaN on silicon (2001) substrates by RF plasma chemical vapor deposition with ZnO buffer layer', Phys. Stat. Sol. A, Vol. 176, p. 579, 1999
  2. B. J. Jin, H. S. Woo, Im S., H. Bae, and S. Y. Lee, 'Relationship between photoluminescence and electrical properties of ZnO thin films grown by pulsed laser deposition', Applied Surface Science, Vol. 169-170, p. 521, 2001 https://doi.org/10.1016/S0169-4332(00)00751-0
  3. X. Q. Meng, W. Zhen, J. P. Guo, and X. J. Fan, 'Structural, optical and electrical properties of ZnO and ZnO-$Al_2O_3$ films prepared by de magnetron sputtering', Appl Phys A: Mater. Sci. Processing, Vol. 70, No.4, p. 421, 2000 https://doi.org/10.1007/s003390051060
  4. T. Minemoto, T. Negami, S. Nishiwaki, H. Takakura, and Y. Hamakawa, 'Preparation of $Zn_{1-x}Mg_xO$ films by radio frequency magnetron sputtering', Thin Solid Films, Vol. 372, p. 173, 2000 https://doi.org/10.1016/S0040-6090(00)01009-9
  5. J. J. Chen, Y. Gao, F. Zeng, D. M. Li, and F. Pan, 'Effect of sputtering oxygen partial pressures on structure and physical properties of high resistivity ZnO films', Applied Surface Science, Vol. 223, p. 318, 2004 https://doi.org/10.1016/j.apsusc.2003.09.015
  6. J. S. Yang, Y. H. Yoon, M. J. Keum, I. H. Son, and K. H. Kim, 'Preparation of transparent conductive thin films by facing targets sputtering system', Surface and Coating Technology, Vol. 169-170, p. 575, 2003 https://doi.org/10.1016/S0257-8972(03)00101-4
  7. A. P. Roth, J. B. Webb, and D. F. Williams, 'Absorption edge shift in ZnO thin films at high carrier densities', Solid State Communications, Vol. 39, p. 1269, 1981 https://doi.org/10.1016/0038-1098(81)90224-6
  8. T. Tsuji and M. Hirohashi, 'Influence of oxygen partial pressure on transparency and conductivity of RF sputtered Al-doped ZnO thin films', Applied Surface Science., Vol. 157, p. 47, 2000 https://doi.org/10.1016/S0169-4332(99)00517-6

피인용 문헌

  1. Homogeneous multi-layered films of SiO x and SiO x N y deposited on PEN by using a facing target sputtering system for passivation of organic light emitting diodes vol.63, pp.6, 2013, https://doi.org/10.3938/jkps.63.1181
  2. Preparation of SiO$_{2}$ Passivation Thin Film for Improved the Organic Light-Emitting Device Life Time vol.50, pp.8, 2011, https://doi.org/10.1143/JJAP.50.08KE02
  3. Preparation of SiO2Passivation Thin Film for Improved the Organic Light-Emitting Device Life Time vol.50, pp.8S2, 2011, https://doi.org/10.7567/JJAP.50.08KE02
  4. Enhanced Permeability Property of Silicon Oxide Thin Films Deposited by Facing Target Sputtering System for OLED Application vol.626, pp.1, 2016, https://doi.org/10.1080/15421406.2015.1075845
  5. Homogeneous Al2O3Multilayered Films Deposited on Poly(ethylene terephthalate) by Facing-Target Sputtering System for Thin-Film Passivation of Organic Light-Emitting Diodes vol.52, pp.12R, 2013, https://doi.org/10.7567/JJAP.52.126201