반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

지능형 반도체 세정장비 설계에 관한 연구

A Study on Design of Intelligent Wet Station for Semiconductor

  • 김종원 (한국기술교육대학교 정보기술공학부) ;
  • 홍광진 (한국기술교육대학교 정보기술공학부) ;
  • 조현찬 (한국기술교육대학교 정보기술공학부) ;
  • 김광선 (한국기술교육대학교 메카트로닉스공학부) ;
  • 김두용 (순천향대학교 정보기술공학부) ;
  • 조중근 ((주)세메스)
  • Kim Jong Won (School of Information Technology Engineering , Korea University of Technology and Education) ;
  • Hong Kwagn Jin (School of Information Technology Engineering , Korea University of Technology and Education) ;
  • Cho Hyun Chan (School of Information Technology Engineering , Korea University of Technology and Education) ;
  • Kim Kwang Sun (School of Mechatronics Engineering, Korea University of Technology and Education) ;
  • Kim Doo Yong (Division of Information Technology Engineering, Soonchunhyang University) ;
  • Cho Jung Keun (SEMES Co, Ltd.)
  • 발행 : 2005.09.01
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초록

As the integrated devices become more and more sophistcated, the diameter of wafers increased up to 300 mm and strict level of cleaning is necessary to remove the particulates on the surface of wafer. Therefore we need a new type of wet-station which can reduce DI water and chemical in the cleaning process. Moreover, it is important to control the temperature and the concentration of chemical in the wet-station. In the conventional chemical supply system, it is difficult not only to fit the mixing rate of chemicals in cleaning process, but also to fit the quantity and temperature. Thus, we propose a new chemicals supply system, which overcomes above problems by the analysis of fluid and thermal transfer on chemical supply system.

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