References
- Chou, S. Y., Krauss, P. R. and Renstrom, P. J., 'Imprint of sub-25 nm vias and trenches in polymers,' Appl. Phys. Lett., Vol. 67, No. 20, pp. 3114-3116, 1995 https://doi.org/10.1063/1.114851
- Chou, S. Y., Krauss, P. R. and Renstrom, P. J., 'Nanoimprint lithography,' J. Vac. Sci. Technol. B, Vol. 14, No. 6, pp. 4129-4133, 1996 https://doi.org/10.1116/1.588605
- Chou, S. Y., Krauss, P. R., Zhang, W., Guo, L. J. and Zhuang, L., 'Sub-10 nm imprint lithography and applications,' J. Vac. Sci. Technol. B, Vol. 15, pp. 2897-2904, 1997 https://doi.org/10.1116/1.589752
- Austin, M. D., Ge, H., Wu, W., Li, M., Yu, Z., Wasserman, D., Lyon, S. A. and Chou, S. Y., 'Fabrication of 5nm linewidth and 14 nm pitch features by nanoimprint lithography,' Appl. Phys. Lett., Vol. 84, No. 26, pp. 5299-5301, 2004 https://doi.org/10.1063/1.1766071
- Hirai, Y., Yoshida, S., Takagi, N., Tanaka, Y., Yabe, H., Sasaki, K., Sumitani, H. and Yamamoto, K., 'High aspect pattern fabrication by nanoimprint lithography using fine diamond mold,' Jpn. J. Appl. Phys., Vol. 42, pp. 3863-3866, 2003 https://doi.org/10.1143/JJAP.42.3863
- Chou, S. Y., Kelmel, C. and Gu, J., 2002, 'Ultrafast and Direct Imprint of Nanostructures in Silicon,' Nature, Vol. 417, No. 20, pp. 835-837, 2002 https://doi.org/10.1038/nature00792
- Heyderman, L. J., Schift, H., David, C., Gobrecht, J. and T. Schweizer, 'Flow behaviour of thin polymer films used for hot embossing lithography,' Microelectronic Eng., Vol. 54, pp. 229-245, 2000 https://doi.org/10.1016/S0167-9317(00)00414-7
- Cross, G. L. W., O'Connel, B. S. and Pethica, J. B., 'Influence of elastic strains on the mask ratio in glassy polymer nanoimprint,' Appl. Phys. Lett., Vol. 86, 081902, 2004
- Martin, C., Ressier, L. and Peyrade, J. P., 'Study of PMMA recoveries on micrometric patterns replicated by nano-imprint lithography,' Physica E, Vol. 17, pp. 523-525, 2003 https://doi.org/10.1016/S1386-9477(02)00859-7
- Hirai, Y., Yoshida, S. and Takagi, N., 'Defect analysis in thermal nanoimprint lithography,' J. Vac. Sci. Technol. B, Vol. 20, No. 6, pp. 2765-2770, 2003
- Young, W. B., 'Analysis of the nanoimprint lithography with a viscous model,' Microelectronic. Eng., Vol. 77, pp. 405-411, 2005 https://doi.org/10.1016/j.mee.2005.01.024
- Hsu, Q. C., Wu, C. D. and Fang, T. H., 'Deformation mechanism and Punch taper effects on nanoimprint process by molecular dynamics,' Jpn. J. of Appl. Phys., Vol. 43, No. 11A, pp. 7665-7669, 2004 https://doi.org/10.1143/JJAP.43.7665
- 강지훈, 김광섭, 김경웅, '나노임프린트 리소그래피에서의 폴리머 레지스트의 변형에 관한 분자 동역학시뮬레이션,' 대한기계학회 논문집 A권, 제 29권 6호, pp. 852-859, 2005
- Kang, J. H., Kim, K. S. and Kim, K. W., 'Molecular dynamics study of pattern transfer in nanoimprint lithography,' The International Tribology Conference, Book of Synopses, pp. 355, 2005
- Okada, O., Oka, K., Kuwajima, S., Toyoda, S. and Tanabe, K., 'Molecular simulation of an amorphous poly(methylmethacrylate)-poly(tetrafluoroethylene) interface,' Comput. Theo. Polymer Sci., Vol. 10, pp. 371-381, 2000 https://doi.org/10.1016/S1089-3156(00)00002-7
- Sides, S. W., Curro, J., Grest, G. S., Stevens, M. J., Soddemann, T., Habenschuss, A. and Londono, J. D., 'Structure of poly(dimethylsiloxane) melts: Theory, simulation, and experiment,' Macromolecules, Vol. 35, pp.6455-6465, 2002 https://doi.org/10.1021/ma020014k
- Kittel, H., 'Introduction to solid state physics,' 6th ed., Wiley, New York, 1986