저압 나노여과 공정에서의 유해성 유기물질의 거동

Behavior of Hazardous Organic Compounds in Low-Pressure Nanofiltration Process

  • 오정익 (한국과학기술연구원 수질환경 및 복원연구센터) ;
  • 이석헌 (한국과학기술연구원 수질환경 및 복원연구센터) ;
  • 이보영 (한국환경기술진흥원)
  • 투고 : 2004.01.05
  • 심사 : 2004.03.09
  • 발행 : 2004.04.15

초록

Behavior of hazardous organic compounds including bisphenol A, phtalic acid, and phosphoric acid in low pressure nanofiltration process were investigated. In the case of NTR729HF, rejection of all target organic compounds except 2-H-Benzothiazol and 2-isopropyl phenol was more than 90%. The lowest rejection for 2-H-Benzothiazol was observed in another membranes. The UTC60 and UTC20 showed similar rejection characteristics of hazardous organic compounds. Although the rejection of Bisphenol A, n-buthyl benzenesulfoneamide, N-ethyl-p-toluensulfonamide, 2-H-benzothiazol, p-t-butylphenol and 2-isopropyl phenol was less than 30%, the rejection of tributyl phosphate, triethyl phosphate, camphor, 2,2,4 trimethyl 1,3 pentandiol and diphenyl amine was more than 90% in the case of UTC60 and UTC20. The rejection characteristics of various hazardous organic compounds were converted into one parameter Ks, which was proposed in the diffusion-convection model. The Ks of hazardous organic compounds were discussed by comparing with their solute size represented by Stokes radius. The diffusion convection model considering Ks was successful to interpret rejection characteristics of hazardous organic compounds by low-pressure nanofiltration membranes.

키워드

참고문헌

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