참고문헌
- Y. Yang, A.J. Heeger, Appl. Phys. Lett. 64, 1994, 124 https://doi.org/10.1063/1.110899
- S.A. VanSlyke, C.H. Chen, C.W. Tang, Appl. Phys. Lett. 69, 1996, 2160 https://doi.org/10.1063/1.117151
- Y. Gao, G. Yu, C. Zhang, R. Menon, A.J. Heerger, Synth. Met. 87, 1997, 171 https://doi.org/10.1016/S0379-6779(97)03823-X
- Z.B. Deng, X.M. Ding, S.T. Lee, W.A. Gambling, Appl. Phys. Lett. 74, 1999, 2227 https://doi.org/10.1063/1.123809
- A. Yamamori, C. Adachi, T. Koyama, Y. Taniguchi, Appl. Phys. Lett. 72, 1998, 2147 https://doi.org/10.1063/1.121304
- Y. Sato, T. Ogata, S. Ichinosawa, M. Fugono, H. Kanai, Proc. SPIE Org. Light Emitting Mater. Dev. III 3797, 1999, 198
- T.M. Brown, J.S. Kim, R.H. Friend, F. Cacialli, R. Daik, W.J. Feast, Appl. Phys. Lett. 75, 1999, 1679 https://doi.org/10.1063/1.124789
- S.A. VanSlyke, C.W. Tang, US Patent 5, 061, 569, 1991
- Y. Sato, S. Ichinosawa, H. Kanai, lEEe, J. Selected Top. Quantum. Electron. 4, 1998, 40 https://doi.org/10.1109/2944.669464
- I.Y. Wu, J.T. Lin, Y.T. Tao, E. Balasubramaniam, Y.Z. Su, C.W. Ko, Chem. Mater. 13, 2001, 2626 https://doi.org/10.1021/cm0100568
- I.D.L. Albert, T.J. Marks, M.A. Ratner, J. Am. Chem. Soc. 119, 1997, 6575 https://doi.org/10.1021/ja962968u
- U. Mischke, P. Bauerle, J. Mater. Chem, 10, 2000, 1471 https://doi.org/10.1039/a908713c
- K.R.J. Thomas, J.T. Lin, Y.T. Tao, C.W. Ko, Adv. Mater. 12, 2000, 1949 https://doi.org/10.1002/1521-4095(200012)12:24<1949::AID-ADMA1949>3.0.CO;2-X
- S. Yin, Y. Hua, S, Chen, X. Yang, Y. Hou, X. Xu, Synth. Met, 111, 2000, 109 https://doi.org/10.1016/S0379-6779(99)00311-2
- Y. Shao, Y. Nishio, Y. Hamada, H. Takahashi, T. Usuki, K. Shibata, J. Mater. Chem. 10, 2000, 157 https://doi.org/10.1039/a903239h
- N. Johansson, J. Salbeck, J. Bauer, F. Weissortel, P. Broms, A. Andersson, W.R. Salaneck, Adv. Mater. 10, 1998, 1136
- N. Noda, Y. Shirota, J. Am. Chem. Soc. 120,1998, 9714 https://doi.org/10.1021/ja9817343
- Y. Sakamoto, T. Suzuki, A. Miura, H. Fujikawa, S. Tokito, Y. Taga, J. Am. Chem. Soc. 122, 2000, 1832 https://doi.org/10.1021/ja994083z
- Y.T. Tao, E. Balasubramaiam, A. Danel, P Tomasik, Appl. Phys. Lett. 77, 2000, 933 https://doi.org/10.1063/1.1288811
- 20. P. Lu, H. Hong, G. Cai, P. Djurovich, W.P. Weber, M.E. Thompson, J. Am. Chem. Soc. 122, 2000, 7480 https://doi.org/10.1021/ja000354q
- J.L. Fox, C.H. Chen, US Patent 4, 736, 032, 1988
- T. Inoe, K. Nakatani, Japaese Patent 6, 009, 952, 1994
- J. Ito, Japanese Patent 7, 166, 160, 1995
- K. Yamashita, J. Futenma, T. Mori, T. Mizutani, Synth. Mate, 111, 2000, 87 https://doi.org/10.1016/S0379-6779(99)00366-5
- C.H. Chen, J. Shi, K.P. Klubek, US Patent 5, 908, 581, 1999
- Y. Sato, Semicond. Semimetals 64, 2000, 209
- K. Okumoto, T. Ohara, T. Noda, Y. Shirota Synth. Met. 121, 2001, 1655 https://doi.org/10.1016/S0379-6779(00)00857-2
- Y.H. Kim, D.C. Shin, S.H. Kim, C.H. Ko, H.S. Yu, Y.S. Chae, S.K. Kwon, Adv. Mater. 13, 2001, 1690 https://doi.org/10.1002/1521-4095(200111)13:22<1690::AID-ADMA1690>3.0.CO;2-K
- Y. Geng, D. Katsis, S.W. Culligan, J.J. Ou, S.H.Chen, L.J. Rothberg, Chem. Mater. 14, 2002, 463 https://doi.org/10.1021/cm0109084
- L.H. Chan, H.C. Yeh, C.T. Chen, Adv. Mater, 13, 2001, 1637 https://doi.org/10.1002/1521-4095(200111)13:21<1637::AID-ADMA1637>3.0.CO;2-S
- Y. Liu, J. Guo, H. Zhang, Y. Wang, Angew. Chem. Lint. Ed. 41, 2002, 182 https://doi.org/10.1002/1521-3773(20020104)41:1<182::AID-ANIE182>3.0.CO;2-B
- M.A. Baldo, D.F. O'Brien, Y. You, A. Shoustikov, S. Sibley, M.E. Thompson, S.R. Forrest, Nat. London 395, 1998, 151 https://doi.org/10.1038/25954
- M.D. MeGehee, T. Bergstedt, C. Zhang, AP. Saab, M.B. O'Regan, G.C. Bazan, V.I. Srdanov, A.J. Heerger, Adv. Mater. 11, 1999, 1349 https://doi.org/10.1002/(SICI)1521-4095(199911)11:16<1349::AID-ADMA1349>3.0.CO;2-W
- C. Adachi, M.A. Baldo, S. Lamansky, P.E. Burrows, M.E. Thompson, S.R. Forrest, Appl. Phy. Lett. 75, 1999, 4 https://doi.org/10.1063/1.124258
- 평판 디스플레이의 현황, 특허청
- 평판 디스플레이의 기술 개발 전망, 특허청
- H.Z. Xie, M.W. Liu, O.Y. Wang, X.H. Zhang, C.S. Lee, L.S. Hung, S.T. Lee, P.F. Teng, H.L. Kwong, H. Zheng, C.M. Che, Adv. Mater. 13, 2001, 1245 https://doi.org/10.1002/1521-4095(200108)13:16<1245::AID-ADMA1245>3.0.CO;2-J
- S. Welter, K. Brunner, J.W. Hofstraat, L. De Cola, Nature, 421, 2003, 54 https://doi.org/10.1038/nature01309
- K.R. Justin Thomas, J.T. Lin, Y.T. Tao, C.H. Chuen, Chem. Mater. 14, 2002, 3852 https://doi.org/10.1021/cm0202512
- K. Danel, T.H. Huang, J.T. Lin, Y.T. Tao, C.H Chuen, Chem. Mater. 14, 2002, 3860 https://doi.org/10.1021/cm020250+
- Y.T. Tao, C.H. Chuen, C.W. Ko, J.W. Peng, Chem. Mater. 14, 4256 https://doi.org/10.1021/cm020284h
- K.R. Justin Thomas, J.T. Lin, Y.T. Tao, C.H Chuen, Adv. Mater. 14, 2002, 822 https://doi.org/10.1002/1521-4095(20020605)14:11<822::AID-ADMA822>3.0.CO;2-S
- H.T. Shih, C.H. Lin, H.H. Shih, C.H. Cheng, Adv Mater. 14, 2002, 1409 https://doi.org/10.1002/1521-4095(20021002)14:19<1409::AID-ADMA1409>3.0.CO;2-O
- S.C. Lo, N.A. H. Male, J.P. J. Markham, S.W. Magennis, P.L. Burn, O.V. Salata, I.D. W. Samuel, Adv. Mater. 14, 2002, 975 https://doi.org/10.1002/1521-4095(20020705)14:13/14<975::AID-ADMA975>3.0.CO;2-D
- M. Thelakkat, Macromol. Mater. Eng. 287, 442 https://doi.org/10.1002/1439-2054(20020701)287:7<442::AID-MAME442>3.0.CO;2-H
- P. Strohriegl, J.V. Grazulevicius, Adv. Mater. 14, 2002, 1439 https://doi.org/10.1002/1521-4095(20021016)14:20<1439::AID-ADMA1439>3.0.CO;2-H
- T.H. Huang, J.T. Lin, Y.T. Tao, C.H. Chuen, Chem. Mater, 15, 2003, 4854 https://doi.org/10.1021/cm034631e
- P. Kundu, K.R. Justin Thomas, J.T. Lin, Y.T. Tao, C.H. Chien, Adv. Funct. Mater. 13, 2003, 445 https://doi.org/10.1002/adfm.200304308
- S.C. Lo, E.B. Namadas, P.L. Burm, I.D. W. Samuel, Macromolecules, 36, 2003, 9721 https://doi.org/10.1021/ma030383w
- R.J. Holmes, B.W. D'Andrade, S.R. Forrest, X. Ren, J. Li, M.E. Thompson, Appl. Phys. Lett. 83, 2003, 3818 https://doi.org/10.1063/1.1624639
- Y.J. Su, H.L. Hung, C.L. Li, C.H, Chien, Y.T. Tao, P.T. Chou, S. Datta, R.S. Liu, Adv. Mater. 15,2003, 884 https://doi.org/10.1002/adma.200304630
- P. Wang, Z. Xie, S. Tong, O. Wong, C.S. Lee, N. Wong, L. Hung, S. Lee, Chem. Mater. 15, 2003, 1913 https://doi.org/10.1021/cm0209214
- J. Li, D. Liu, Z. Hong, S. Tong, P. Wang, C. Ma, 0. Lengyel, C. S. Lee, H.L. Kwong, S. Lee, Chem. Mater. 15, 2003, 1486 https://doi.org/10.1021/cm0209822
- Y. Kan, L. Wang, Y. Gao, L. Duan, G. Wu, Y. Qiu, Synthetic Metals, 141, 2003, 245 https://doi.org/10.1016/S0379-6779(03)00406-5
- H. Benmansour, T. Shioya, Y. Sato, G. C. Bazan, Adv. Funct. Mater. 13, 2003, 883 https://doi.org/10.1002/adfm.200304456
- K. D. Belfield, M.V. Bondar, A.R. Morales, O. Yavuz, O.V. Przhonska, J. Phys. Org. Chem. 16, 2003, 194 https://doi.org/10.1002/poc.593
- K.R. Justin Thomas, J.T. Lin, M. Velusamy, Y.T. Tao, C.H. chuen, Adv. Funct. Mater. 14, 2004, 83 https://doi.org/10.1002/adfm.200304486
- T.D. Anthopoulos, M.J. Frampton, E.B. Namdas, P.L. Burn, I.D.W. Samuel, Adv. Mater. 16, 2004, 557 https://doi.org/10.1002/adma.200306095
- W.J. Shen, R. Dodda, C.C. Wu, F.I. Wu, T.H. Liu, H.H. Chen, C.H. Chen, C.F. Shu, Chem. Mater. 16, 2004, 930 https://doi.org/10.1021/cm0345117
- W.J. Shen, R. Dodda, C.C. Wu, F.I. Wu, T.H. Liu, H.H. Chen, C.H. Chen, C.F. Shu, Chem. Mater. 16, 2004, 930 https://doi.org/10.1021/cm0345117