Fabrication of Miniaturized Shadow-mask for Local Deposition

국부증착용 마이크로 샤도우 마스크 제작

  • Published : 2004.08.01

Abstract

A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etching of 100-mm full wafer. The fabricated shadow mask has over 388 membranes with apertures of micrometer length scale ranging from 1${\mu}{\textrm}{m}$ to 100s ${\mu}{\textrm}{m}$ made on each 2mm${\times}$2mm large low stress silicon nitride membrane. It allows micro scale patterns to be directly deposited on substrate surface through apertures of the membrane. This shadow mask method has much wider choice of deposit materials, and can be applied to wider class of surfaces including chemical functional layer, MEMS/NEMS surfaces, and biosensors.

Keywords

References

  1. Burger, G.J., Smulders, E.J.T., Berenschot, J.W., Lammerink, T.S.J., Fluitman, J.H.J. and Imai, S., 'High-resolution shadow-mask patterning in deep holes and its application to an electrical wafer feed through,' Sensors and Actuators A, Vol. 54, pp. 669-673, 1996 https://doi.org/10.1016/S0924-4247(97)80035-0
  2. Brugger, J., Andreoli, C., Despont, M., Drechsler, U., Rothuizen, H. and Vettiger, P., 'Self-aligned 3D shadow mask techique for patterning deeply recessed surfaces of micro-electro-mechanical systems devices,' Sensors and Actuators, Vol. 76, pp. 329-334, 1999 https://doi.org/10.1016/S0924-4247(98)00286-6
  3. Tixier, A., Mita, Y., Gouy, J.P. and Fujita, H., 'A silicon shadow mask for deposition on isolated areas,' J. Micromech. Microeng., Vol. 10, pp. 157-162, 2000 https://doi.org/10.1088/0960-1317/10/2/310
  4. Kim, G.M., Kim, B. and Brugger, J., 'AlI-Photoplastic microstencil with self-alignment for multiple Iayer shadow-mask patterning,' Sensors and Actuators A, Vol. 107, pp. 132-136, 2003 https://doi.org/10.1016/S0924-4247(03)00298-X
  5. Jackman, R.J., Duffy, D.C., Cherniavskaya, O. and Whitesides, G.M., 'Using elastomeric membranes as dry resists and for dry lift-off,' Langmuir, Vol. 15, pp. 2973-2984, 1999 https://doi.org/10.1021/la981591y
  6. Deshmukh, M.M., Ralph, D.C., Thomas, M. and Silcox, J., 'Nanofabrication using a stencil mask,' Applied Physics Letters, Vol. 75, pp. 1631-1633, 1999 https://doi.org/10.1063/1.124777
  7. Brugger, J., Berenschot, J.W., Kuiper, S., Nijdam, W., Otter, B. and Elwenspoek, M., 'Resistless patterning of sub-micron structures by evaporation through nanostencils,' Microelectronic Engineering, Vol. 53, pp. 403-405, 200 https://doi.org/10.1016/S0167-9317(00)00343-9
  8. Kim, G.M., van den Boogaart, M.A.F. and Brugger, J., 'Fabrication and application of a full wafer size micro/nanostencil for multiple length-scale surface patterning,' Microelectronic Engineering, Vol. 67-68, pp. 609-614, 2003 https://doi.org/10.1016/S0167-9317(03)00121-7