Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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Fundamental Process Development of a Ultramicro-Stereolithography using a Femto-second Laser for Manufacturing Nano-scaled Features

펨토초 레이저를 이용한 극미세 광조형 기반공정 개발

  • 박상후 (한국과학기술원 기계공학과 대학원) ;
  • 임태우 (한국과학기술원 기계공학과 대학원) ;
  • 정창균 (한국과학기술원 기계공학과 대학원) ;
  • 이신욱 (한국과학기술원 물리학과 대학원) ;
  • 이성구 (한국과학기술원 물리학과 대학원) ;
  • 공홍진 (한국과학기술원 물리학과) ;
  • 양동열 (한국과학기술원 기계공학과)
  • Published : 2004.03.01
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Abstract

The miniaturization technologies are perceived as potential key technologies of the future. They will bring about completely different ways in which people and machines interact with the physical world. However, at the present time, the primary technologies used fur miniaturization are dependent on the microelectronic fabrication techniques. The principal shortcomings associated with such techniques are related to the inability of to produce arbitrary three-dimensional features not only in electronics but also in a wide range of metallic materials. In this paper, a ultramicro-stereolithography system assisted with a femto-second laser was developed to fabricate the arbitrary three-dimensional nano/micro-scaled features. In the developed process, a femto-second laser is projected according to CAD data on a photosensitive monomer resin, it induces polymerization of the liquid resin. After the polymerization, a droplet of ethanol is dropped to remove the liquid resin and then the polymerized nano-scaled features only remain. By a newly developed process, miniature devices for an extremely wide range of applications would become a technologically feasible reality. Some of nano/micro-scaled features as examples were fabricated to prove the usefulness of this study at the fundamental stage.

Keywords

References

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