마그네트론 스퍼터에 의한 Carbon Nitride 박막의 합성 및 특성에 관한 연구

A Study on the Synthesis and Characterization of Carbon Nitride Thin Films by Magnetron Sputter

Amorphous carbon nitride thin films have been deposited on silicon (100) by reactive magnetron sputtering method. The basic depositon parameters varied were the r.f. power(up to 250 W), the deposition pressure in the reactor(up to 100 mtorr) and Ar:$N_2$ gas ratio. FT-IR and X-ray photoelectron spectra showed the presence of different carbon-nitrogen bonds in the films. The surface topography of the films was studied by scanning electron microscopy(SEM) and atomic force microscopy(AFM).