Journal of Korean Vacuum Science & Technology
- Volume 7 Issue 2
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- Pages.45-56
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- 2003
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- 1226-6167(pISSN)
Development of High Flux Metal Ion Plasma Source for the Ion Implantation and Deposition
- Kim, Do-Yun (Department of Physics, Kyungpook National University) ;
- Lee, Eui-Wan (Department of Physics, Kyungpook National University)
- Published : 2003.12.01
Abstract
A high flux metal plasma pulse ion source, which can simultaneously perform ion implantation and deposition, was developed and tested to evaluate its performance using the prototype. Flux of ion source was measured to be 5 A and bi-polar pulse power supply with a peak voltage of 250 V, repetition of 20 Hz and width of 100