Journal of Magnetics

The Korean Magnetics Society (한국자기학회)
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The Influence of Thermal Annealing on Magnetostatic Properties of thin Ni Films

  • Shalyguina, E.E. (Physical Faculty, Moscow State University) ;
  • Kim, Chong-Oh (Department of Materials Engineering, Chungnam National University) ;
  • Kim, Cheol-Gi (Department of Materials Engineering, Chungnam National University) ;
  • Seo, Jung-Hwa (Department of Materials Engineering, Chungnam National University)
  • Published : 2003.12.01
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Abstract

The magnetostatic properties of the as-deposited and annealed at T=300 and 400$^{\circ}C$ Ni films were investigated employing both magneto-optical magnetometer and VSM. The Ni films of 50∼200 nm thicknesses were prepared by DC magnetron sputtering technique. The strong influence of annealing temperature on magnetostatic properties of the studied samples was discovered. For the annealed Ni films, the increase of the coercivity H$_c$ (up to 4 times) in comparison with that of as-deposited samples was revealed. The obtained results were explained by using crystallographic structural data of the samples.

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