The Transactions of the Korean Institute of Electrical Engineers C (대한전기학회논문지:전기물성ㆍ응용부문C)

The Korean Institute of Electrical Engineers (대한전기학회)
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Study on Improving the luminous Efficiency of AC PDPs using the Dual Mode Discharge Electrode Structure Having Short-Gap and Long-Gap Discharge

Short-gap과 Long-gap의 이중 방전 전극 구조를 갖는 AC형 플라즈마 표시기의 효율 향상에 대한 연구

  • Published : 2003.11.01
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Abstract

In this paper, we presents the characteristics of the new electrode structure in an AC Plasma Display Panel(PDP) that can generate dual mode discharges with a combination of short-gap and long-gap discharges. The experiment results show that the discharge voltage of the new electrode structure is mainly determined by short-gap discharge and the luminous efficiency is improved by 20% compared with the conventional electrode structure. The improvement of luminous efficiency is mainly caused by higher VUV generation and broader distribution from Ole ICCD camera measurements.

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References

  1. L. F. Weber, Inform Display, vol. 16, no. 12, pp 16-20, 2000
  2. A. Sobel, Information Display, vol. 14, no. 9, pp 26-28, 1998
  3. G. Oversluizen, S. de Zwart, T. Dekker, T. Juestel, and S. van Heusden, IDW'01, pp. 833-836
  4. B. K. Min, H. Y. Choi, S. H. Lee, and H. S. Tae, J. Vac. Sci. Technol. B 19(1), pp. 7-13, Jan/Feb. 2001 https://doi.org/10.1116/1.1333077
  5. Y. Hashimoto, Y. Sea, O. Toyoda, K. Betsui, T. Kosada, and F. Namiki, SID'01, pp. 1328-1331
  6. C. Koshio, H. Taniguchi, K. Amemiya, N.. Saegusa, T. Komaki, and Y. Sato, IDW'01, pp. 781-784, 2001
  7. C. H. Park, S. H. Lee, D. H. Kim, Y. K. Kim, and J. H Shin, IEEE Trans. Electron Devices, vol. 48, NO. 10, pp 2255-2259, Oct. 2001 https://doi.org/10.1109/16.954463
  8. C. K. Y00n, Y. J. Kim, J. H. Sea, M. S. Yo0, C. B. Park, W. J. Chung, J. H. Yang, K. W. Whang, and K. C. Choi, SID'01, pp 1332-1335, 2001
  9. T. Shinoda, M. Wakitani, T. Nanto, N. Awaji, and S. Kanagu, IEEE Trans. Electron Device, vol. 47, No.1, pp. 77-81, Jan. 2000 https://doi.org/10.1109/16.817570
  10. T. Akiyama, and M. Ueoka, ASID'95, pp. 377-380, 1995
  11. R. Ganter, J. Ouyang, Th. Callegari, and J. P. Boeuf, J. Appl, Phys., Vol. 91, No.3, pp. 992-999, Feb, 2002 https://doi.org/10.1063/1.1425425
  12. J. H. Sea, W. J. Chung, C. K. Y00n, J. K. Kim, and K. W. Whang, IEEE Trans. Plasma Science, Vol. 29, No.5, pp.824-831, Oct. 2001 https://doi.org/10.1109/27.964482
  13. K. Tachibana, S. Feng, and T. Sakai, J. Appl, Phys., Vol. 88, No.9, pp. 4967-4974, Nov. 2000 https://doi.org/10.1063/1.1314312
  14. H. Uchike, ASID'98, pp. 195-198, 1998
  15. G. S. Cho, E. H. Choi, Y. G. Kim, D. I. Kim, H. S. Uhm, Y. D. J00, J. G. Han, M. C. Kim, J. D. Kim, J. Appl, Phys., Vol. 87, No.9, pp. 4113-4118, May. 2000 https://doi.org/10.1063/1.373038