E2M - 전기 전자와 첨단 소재 (Electrical & Electronic Materials)
- 제16권9호
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- Pages.63.2-64
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- 2003
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- 2982-6268(pISSN)
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- 2982-6306(eISSN)
Epitaxial growth of yttrium-stabilized HfO$_2$ high-k gate dielectric thin films on Si
- Dai, J.Y. (Dept. of Applied Physics, The Hong Kong Polytechnic University) ;
- Lee, P.F. (Dept. of Applied Physics, The Hong Kong Polytechnic University) ;
- Wong, K.H. (Dept. of Applied Physics, The Hong Kong Polytechnic University) ;
- Chan, H.L.W. (Dept. of Applied Physics, The Hong Kong Polytechnic University) ;
- Choy, C.L. (Dept. of Applied Physics, The Hong Kong Polytechnic University)
- 발행 : 2003.09.01
초록
Epitaxial yttrium-stabilized HfO
키워드