References
- T. Yoshikawa, S. Kohmoto, S. Sugimoto, K. Askawa, Electronics and Communications in Japan, Part 2 (Electronics), 77 (1994) 24
- A. Matsutani, F. Koyama, K. Iga, Jap. J. Appl. Phys., 33 (1994) 6737 https://doi.org/10.1143/JJAP.33.6737
- O. Wada, Microelectronics Reliability, 39 (1999) 1839 https://doi.org/10.1016/S0026-2714(99)00193-6
- K. Mochizuki, T. Oka, K. Ouchi, T. Tanoue, Solid-State Electron., 43 (1999) 142
- T. Low, T. Shirley, C. Hutchison, G. Essilifie, W. Whitely, B. Yeats, D. D'Avanzo, Solid-State Electron.,43 (1999) 1437 https://doi.org/10.1016/S0038-1101(99)00086-6
- F. Ren, F. F. Kopf, J. M. Kuo, J. R. Lothian, J. W. Lee, S. J. Pearton, R. J. Shul, C. Constantine, D. Johnson, Solid State Electronics, 42 (1998) 749 https://doi.org/10.1016/S0038-1101(97)00292-X
- J. W. Lee, K. D. Mackenzie, D. Johnson, R. J. Shul, S. J. Pearton, C. R. Abemathy, F. Ren, Solid State Electronics, 42 (1998) 1027 https://doi.org/10.1016/S0038-1101(98)80025-7
- Shawn S. H. Hsu, Burhan Bayraktaroglu, Dimitris Pavlidis, Solid-state Electronics, Vol. 43, Issue 8 (August 1999) 1429 https://doi.org/10.1016/S0038-1101(99)00085-4
- R. J. Shul, S. J. Pearton, eds., Handbook of Advanced Plasma Processing Techniques (Springer, Berlin, 2000)
- C. Youtsey, I. Adesida, Chapter 11 in Handbook of Advanced Plasma Processing Techniques, ed R. J. Shul (Springer, Bedin, 2000)
- R. J. Shul, G. B. McClellan, R. D. Rriggs, D. J. Rieger, S. J. Pearton, C. R. Abernathy, J. W. Lee C. Constantine, C. Barratt, J. Vac. Sci. Technol., A 15 (1997) 633
- J. W. Lee, M. W. Devre, B. H. Reelfs, D. Johnson, J. N. Sasserath, F. Clayton, D. C. Hays, S. J. Pearton J. Vac. Sci. Technol., A 18 (2000) 1220
- J. W. Lee, C. R. Abernathy, S. J. Peaton, F. Ren, C. Constantine, C. Barratt, R. J. Shul, Appl. Phys. Lett., 70 (1997) 2410 https://doi.org/10.1063/1.118887
- J. W. Lee, C. R. Abernathy, S. J. Pearton, F. Ren, C. Constantine, C. Barratt, Solid State Electronics, 42 (1998) 733 https://doi.org/10.1016/S0038-1101(97)00247-5
- T. Maeda, J. W. Lee, R. J. Shul, J. Han, J. Hong, E. S. Lambers, S. J. Pearton, C. R. Abernathy, W. S. Hobson, Applied Surface Science, 143 (1999) 174 https://doi.org/10.1016/S0169-4332(98)00594-7
- J. W. Lee, S. J. Pearton, F. Ren, R. F. Kopf, J. M. Kuo, R. J. Shul, C. Constantine, D. Johnson, J. of Electrochem. Soc., 145 (1998) 4036 https://doi.org/10.1149/1.1838910
- K. N. Lee, J. W. Lee, J. Hong, C. R. Abernathy, S. J. Pearton, W. S. Hobson, J. of Electronic Materials, 26 (1997) 1279 https://doi.org/10.1007/s11664-997-0070-3
- J. W. Lee, K. N. Lee, R. R. Stradtmann, C. R. Abemathy, S. J. Pearton, W. S. Hobson, F. Ren, J. Vac. Sci. Technol., A 15 (1997) 890
- S. U. Shin, C. I. Kim, E. G. Jang, J. of KIEEME, 14 (2001) 185
- J. W. Lee, K. D. Mackenzie, D. Johnson, R. J. Shul, Y. B. Hahn, D. C. Hays, C. R. Abemathy, F. Ren, S. J. Pearton, J. Vac. Sci. Technol., A 17 (1999) 2183
- W. T. Lim, I. K. Baek, P. G. Jung, J. W. Lee, G. S. Cho, J. I. Lee, K. S. Cho, S. J. Pearton, Korean Journal of Materials Research, 13 (2003) 266 https://doi.org/10.3740/MRSK.2003.13.4.266
- M. A. Liberman, A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, John wiley & Sons, (1994) chapter 12
- A, katz, Indium Phosphide, Related Materials Processing, Technology and Devices, Artech House (1992)