Optimum Design of the Interdigitated CB Structure

  • qiang, Yang-Hong (Institute of Micro-Electronics and Solid-Electronics, University of Electronic Science and Technology of China) ;
  • bi, Chen-Xing (Institute of Micro-Electronics and Solid-Electronics, University of Electronic Science and Technology of China)
  • Published : 2002.09.01

Abstract

Some measures are provided for the optimum design of specific on-resistance $R_{on}$ and breakdown-voltage $V_B$ of interdigitated CB (Composite Buffer) MOSFET, including introducing opposite type impurity into the P region near the $N_+$contact, separating P region from N region with an oxide film, and a groove in the N region near the $P_+$ contact. The new relationship between the $R_{on}$ and $V_B$, which proved by numerical device simulation, are more exact and minute than the qualitative results before.

Keywords

References

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